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Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation

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Chinese Physics B 2015年第2期24卷 336-342页

作者：谢月红徐建刚宋海洋张云光 School of Science Xi'an University of Posts and Telecommunications College of Materials Science and Engineering Xi'an Shiyou University

The effects of a twin boundary（TB） on the mechanical properties of two types of bicrystal Al thin films during the nanoimprint process are investigated by using molecular dynamics *** results indicate that for the TB direction parallel to the imprinting direction,the yield stress reaches the maximum for the initial dislocation nucleation when the mould directly imprints to the TB,and the yield stress first decreases with the increase of the marker interval and then ***,for the TB direction perpendicular to the imprinting direction,the effect of the TB location to the imprinting forces is very small,and the yield stress is greater than that with the TB direction parallel to the imprinting *** results also demonstrate that the direction of the slip dislocations and the deformation of the thin film caused by spring-back are different due to various positions and directions of the TB.

关键词： nanoimprint molecular dynamic simulation twin boundary

Fast patterning and dry-etch of SiN_x for high resolution nanoimprint templates

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Journal of Semiconductors 2009年第6期30卷 138-141页

作者：疏珍万景陆冰睿谢申奇陈宜方屈新萍刘冉 State Key Laboratory of ASIC and System Department of Microelectronics Fudan University Micro and Nanotechnology Centre Rutherford Appleton Laboratory Chilton Didcot Oxon OX11 0QX UK

We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography（EBL） and a dry etch technique on a SiNx substrate,intended for large area *** this end,the highly sensitive chemically amplified resist（CAR）,NEB-22,with negative tone was *** EBL process first defines the template pattern in NEB-22,which is then directly used as an etching mask in the subsequent reactive ion etching（RIE） on the SiNx to form the desired *** properties of both e-beam lithography and dry etch of NEB-22 were carefully studied,indicating significant advantages of this process with some drawbacks compared to when Cr was used as an etching ***,our results open up a good opportunity to fabricate high resolution imprint templates with the prospect of wafer scale manufacturing.

关键词： SiNx templates nanoimprint NEB-22 electron bean lithography reactive ion etch

Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

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Microsystems & Nanoengineering 2017年第1期3卷 146-153页

作者： Mikai Chen Hossein Rokni Wei Lu Xiaogan Liang Mechanical Engineering Department University of MichiganAnn ArborMI 48109USA.

Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered *** exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microstructures with a high uniformity of feature *** this study,we present a study on the applicability of nanoimprint-assisted shear exfoliation for generating ultrathin monolayer and few-layer MoS_(2) structures as well as the critical limits of feature dimensions produced via such nanoimprint and nanoprint-based *** particular,this work shows that give a lateral feature size of MoS_(2) structures that are pre-patterned on a bulk stamp,there exists a critical thickness or aspect ratio value,below which the exfoliated layered structures exhibit major *** exfoliate a highquality,uniform monolayer or few-layer structures,the characteristic lateral feature sizes of such structures need to be in the sub-100 nm *** addition,the exfoliated MoS_(2) flakes of critical thicknesses exhibit prominent interlayer twisting features on their cleaved ***-effect transistors made from these MoS_(2) flakes exhibit multiple(or quasi-analog-tunable)charge memory *** work advances the knowledge regarding the limitations and application scope of nanoimprint and nanoprint processes in manufacturing nano/microstructures based on layered materials and provides a method for producing multi-bit charge memory devices.

关键词： 2D materials charge trapping memory MoS_(2) nanoimprint nanoprint

Fabrication of four-channel DFB laser array using nanoimprint technology for 1.3μm CWDM systems

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Journal of Semiconductors 2014年第11期35卷 74-80页

作者：赵建宜陈鑫周宁黄晓东刘文 Wuhan National Laboratory for Optoelectronics Huazhong University of Science and TechnologySchool of Optical and Electronic Information Accelink Technologies Company Ltd University of Science and Technology of China Institute of Advanced Technology

Four-channel monolithically integrated index-coupled distributed-feedback laser array has been fabricated using nanoimprint technology for 1.3μm CWDM system. Selective lasing wavelength with 20 nm wavelength space is obtained. The present results show that the nanoimprint technology is mature and reliable in the fabrication of DFB laser array.

关键词： semiconductor laser nanoimprint distributed feedback

Fabrication of metal suspending nanostructures by nanoimprint lithography(NIL) and isotropic reactive ion etching(RIE)

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Science China(Technological Sciences) 2009年第5期52卷 1181-1186页

作者： XIE GuoYong ZHANG Jin ZHANG YongYi ZHANG YingYing ZHU Tao LIU ZhongFan Center for Nanoscale Science and Technology(CNST) College of Chemistry and Molecular EngineeringPeking UniversityBeijing 100871China Nanotechnology Industrialization Base of China Tianjin 300457China

We report herein a rational approach for fabricating metal suspending nanostructures by nanoimprint lithography(NIL) and isotropic reactive ion etching(RIE).The approach comprises three principal steps:(1) mold fabrication,(2) structure replication by NIL,and(3) suspending nanostructures creation by isotropic *** this approach,suspending nanostructures with Au,Au/Ti or Ti/Au bilayers,and Au/Ti/Au sandwiched structures are *** Au nanostructures,straight suspending nanostructures can be obtained when the thickness of Au film is up to 50 nm for nano-bridge and 90 nm for nano-finger *** the thickness of Au is below 50 nm for nano-bridge and 90 nm for nano-finger,the Au suspending nanostructures bend upward as a result of the mismatch of thermal expansion between the thin Au films and Si *** leads to residual stresses in the thin Au *** Au/Ti or Ti/Au bilayers nanostructures,the cantilevers bend toward Au film,since Au has a larger thermal expansion coefficient than that of *** in the case of sandwich structures,straight suspending nanostructures are obtained,this may be due to the balance of residual stress between the thin films.

关键词： suspending nanostructure fabrication nanoimprint lithography(NIL) isotropic reactive ion etching(RIE)

Large area mold fabrication for the nanoimprint lithography using electron beam lithography

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Science China(Technological Sciences) 2010年第1期53卷 248-252页

作者： CHU JinKui1,2,MENG FanTao1,2,HAN ZhiTao1,2 & GUO Qing1,2 1 Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian 116024,China 2 Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education,Dalian University of Technology,Dalian 116024,China Key Laboratory for Micro/Nano Technology and System of Liaoning Province Dalian University of Technology Dalian China Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education Dalian University of Technology Dalian China

The mold fabrication is a critical issue for the development of nanoimprint lithography as an effective low-cost and mass production *** paper describes the fabrication process developed to fabricate the large area nanoimprint molds on the silicon *** optimization of e-beam exposure dose and pattern design is *** overlayer process is developed to improve the field stitching accuracy of e-beam exposure,and around 10 nm field stitching accuracy is *** means of the optimization of the e-beam exposure dose,pattern design and overlayer process,large area nanoimprint molds having dense line structures with around 10 nm field stitching accuracy have been *** fabricated mold was used to imprint commercial imprinting resist.

关键词： nanoimprint lithography mold fabrication electron beam lithography

A novel method to mass-produce PDMS stamps based on nanoimprint

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High Technology Letters 2006年第3期12卷 231-234页

作者：孙洪文 Liu Jingquan Chen Di Gu Pan National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Micmfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 P.R. China

Soft lithography is a low-cost and convenient method for the forming and manufacturing of micro/ nanostructures compared to the traditional optical lithography. In soft lithography, poly（dimethylsiloxane）（PDMS） stamps with relief structures have been widely used to transfer patterns. The traditional fabrication approach of PDMS stamps is time-consuming since the master has been occupied during the curing process. By adding and repeating fast nanoimprint step, many intermediate polymeric molds can be produced from the master and these molds can then be employed to replicate more PDMS stamps while the time used is close to that of the common way. We demonstrated this idea by three masters which were made by the DEM （Deepetching, Electroforming and Microreplicating） and FIB （Focused Ion Beam） techniques. The photos show that the patterns on the PMDS stamps successfully duplicated patterns on the origin masters.

关键词： PDMS stamp soft lithography nanoimprint hot embossing DEM technique FIB MMS technique

nanoimprint lithography for high-throughput fabrication of metasurfaces

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Frontiers of Optoelectronics 2021年第2期14卷 229-251页

作者： Dong Kyo OH Taejun LEE Byoungsu KO Trevon BADLOE Jong G.OK Junsuk RHO Department of Mechanical Engineering Pohang University of Science and Technology(POSTECH)Pohang 37673.Republic of Korea Department of Mechanical and Automotive Engineering Seoul National University of Science and Technology(SEOULTECH)Seoul 01811Republic of Korea Department of Chemical Engineering Pohang University of Science and Technology(POSTECH)Pohang 37673Republic of Korea

Metasurfaces are composed of periodic subwavelength nanostructures and exhibit optical properties that are not found in *** have been widely investigated for optical applications such as holograms,wavefront shaping,and structural color printing,however,electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low *** alternative optical technologies,such as holographic lithography and plasmonic lithography,can overcome these drawbacks,such methods are still constrained by the optical diffraction *** break through this fundamental problem,mechanical nanopatteming processes have been actively studied in many fields,with nanoimprint lithography(NIL)coming to the *** NIL replicates the nanopattem of the mold regardless of the diffraction limit,NIL can achieve sufficiently high productivity and patterning resolution,giving rise to an explosive development in the fabrication of *** this review,we focus on various NIL technologies for the manufacturing of ***,we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of *** also discuss recent applications of NIL in the realization of ***,we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.

关键词： nanoimprint scalable fabrication large-area metasurface tailored nanostructure hierarchical nanostructures

Thermo-mechanical dynamics of nanoimprinting anti-reflective structures onto small-core mid-IR chalcogenide fibers [Invited]

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Chinese Optics Letters 2021年第3期19卷 46-52页

作者： Christian R.Petersen Mikkel B.Lotz Christos Markos Getinet Woyessa David Furniss Angela B.Seddon Rafael J.Taboryski O.Bang DTU Fotonik Technical University of DenmarkDK-2800 Kgs.LyngbyDenmark DTU Nanolab Technical University of DenmarkDK-2800 Kgs.LyngbyDenmark NORBLIS DK-2830 VirumDenmark Mid-Infrared Photonics Group University of NottinghamNottingham NG72RDUK NKT Photonics DK-3460 Bi「ke「0dDenmark

Thermal nanoimprinting is a fast and versatile method for transferring the anti-reflective properties of subwavelength nanostructures onto the surface of highly reflective substrates, such as chalcogenide glass optical fiber end faces. In this paper, the technique is explored experimentally on a range of different types of commercial and custom-drawn optical fibers to evaluate the influence of geometric design, core/cladding material, and thermo-mechanical properties. Up to32.4% increased transmission and 88.3% total transmission are demonstrated in the 2–4.3 μm band using a mid-infrared(IR) supercontinuum laser.

关键词： nanoimprint lithography anti-reflection hot imprint chalcogenide glass optical fiber mid-infrared supercontinuum