The influence of pressure on the growth of a-plane GaN on r-plane sapphire substrates by MOCVD

作     者：HE Tao LI Hui DAI LongGui WANG XiaoLi CHEN Yao MA ZiGuang XU PeiQiang JIANG Yang WANG Lu JIA HaiQiang WANG WenXin CHEN Hong 

作者机构：Beijing National Laboratory of Condensed Matter Institute of Physics Chinese Academy of Sciences Beijing 100190 China 

出 版 物：《Science China(Physics,Mechanics & Astronomy)》 (中国科学：物理学、力学、天文学（英文版）)

年 卷 期：2011年第54卷第3期

页      面：446-449页

核心收录：

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0704[理学-天文学] 

基　　金：supported by the National Natural Science Foundation of China (Grant Nos. 60890192 and 50872146) 

主　　题：GaN anisotropy XRD growth pressure MOCVD 

摘      要：Nonpolar a-plane （1120） GaN films have been grown on r-plane （1102） sapphire by metal-organic chemical vapor deposition （MOCVD） under different growth pressures. The as-grown films are investigated by optical microscopy, high-resolution X-ray diffraction （HRXRD） and Raman scattering. As growth pressure rises from 100 mbar to 400 mbar, the surface gets rougher, and the in-plane XRD full width at half maximum （FWHM） along the c-axis [0001] increases while that along the m-axis [1100] decreases. Meanwhile, residential stresses are reduced along both the c-axis and the m-axis. The structural anisotropy feature under 400 mbar is inverted with respect to 100 mbar, and the weakened anisotropy is achieved under a moderate pressure of 200 mbar, probably due to the suppressed Ga atomic migration along the c-axis under a larger pressure. We propose that pressure can affect a-plane growth through the V/III ratio.