Research on the process of fabricating a multi-layer metal micro-structure based on UV-LIGA overlay technology

作     者：Yali Ma Wenkai Liu Chong Liu 

作者机构：Department of Military Materials DistributionArmy Military Transportation UniversityTianjin 300161China School of Mechanical EngineeringDalian University of TechnologyDalian 116023China 

出 版 物：《Nanotechnology and Precision Engineering》 (纳米技术与精密工程（英文）)

年 卷 期：2019年第2卷第2期

页      面：83-88页

核心收录：

学科分类：08[工学] 080502[工学-材料学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：UV-LIGA overlay technology SU-8 photoresist Micro-electroforming technology Multi-layer metal micro-structure 

摘      要：In this paper,we report the study of the process of fabricating a multi-layermetal micro-structure using UV-LIGA overlay technology,includingmask fabrication,substrate treatment,and UV-LIGA overlay *** solve the process problems in the masking procedure,the swelling problemof the first layer of SU-8 thick photoresist was studied *** 5μmline-width compensation and closed 20μmand 30μmisolation strips were designed and fabricated around the micro-structure *** pore problemin the Ni micro-electroforming layer was analyzed and the electroforming parameters were *** pH value of the electroforming solution should be controlled between 3.8 and 4.4 and the current density should be below 3 A/dm^*** solve the problems of high inner stress and incomplete development of the micro-cylinder hole array with a diameter of 30μm,the lithography process was *** pre-baking temperature was increased via gradient heating and rose every 5℃ from 65℃ to 85℃ and then remained at 85℃ for 50 min–1 *** addition,the full contact exposure was ***,a multi-layer metal micro-structure with high precision and good quality of microelectroforming layer was fabricated using UV-LIGA overlay technology.