Modified porous silica antireflective coatings with laser damage resistance for Ti:sapphire

作     者：贾巧英 李海元 刘瑞军 唐永兴 姜中宏 

作者机构：National Laboratory on High Power Laser and PhysicsShanghai Institute of Optics and Fine MechanicsChinese Academy of SciencesShanghai 201800 

出 版 物：《Chinese Optics Letters》 (中国光学快报（英文版）)

年 卷 期：2005年第3卷第4期

页      面：244-246页

核心收录：

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：This work was supported by the High-Tech Research and Development Program of China under Grant No.8638042 

主　　题：Antireflection coatings Atomic force microscopy Inertial confinement fusion Laser damage Morphology Porous materials Sapphire Silica Sol gels Stability Surface treatment Suspensions (fluids) Titanium Viscosity 

摘      要：Porous SiO2 antireflective (AR) coatings are prepared from the colloidal silica solution modified with methyltriethoxysilane (MTES) based on the sol-gel route. The viscosity of modified silica suspensions changes but their stability keeps when MTES is introduced. The refractive indices of modified coatings vary little after bake treatment from 100 to 150℃. The modified silica coatings on Ti:sapphire crystal, owning good homogeneity, display prominent antireflective effect within the laser output waveband (750-850 nm) of Ti:sapphire lasers, with average transmission above 98.6%, and own laser induced damage thresholds (LIDTs) of more than 2.2 J/cm2 at 800 nm with the pulse duration of 300 ps.