Multilayer optics for the EUV and soft X-rays

作     者：Torsten Feigl Sergiy Yulin Nicolas Benoit Norbert Kaiser 

作者机构：Fraunhofer Institut für Angewandte Optik und Feinmechanik Albert-Einstein-Str. 7 D-07745 Jena GermanyFraunhofer Institut für Angewandte Optik und Feinmechanik Albert-Einstein-Str. 7 D-07745 Jena GermanyFraunhofer Institut für Angewandte Optik und Feinmechanik Albert-Einstein-Str. 7 D-07745 Jena GermanyFraunhofer Institut für Angewandte Optik und Feinmechanik Albert-Einstein-Str. 7 D-07745 Jena Germany 

出 版 物：《光学精密工程》 (Optics and Precision Engineering)

年 卷 期：2005年第13卷第4期

页      面：421-429页

核心收录：

学科分类：0808[工学-电气工程] 080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0805[工学-材料科学与工程（可授工学、理学学位）] 0803[工学-光学工程] 0702[理学-物理学] 

主　　题：EUV X射线 多层膜 光学涂覆技术 Mo/Si Cr/Sc Sc/Si 光电子技术 

摘      要：The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.