Numerical Calculations of Some Plasma Parameters of the Capacitively Coupled <i>RF</i>Discharge

作     者：Mohamed Ali Hassouba Ahmed Rida Galaly Usama Mohamed Rashed 

作者机构：Applied Physics Department Faculty of Applied Sciences Taibah University Medina KSA Engineering Science Dept Faculty of Community Umm Al-Qura University Mecca KSA Physics Department Faculty of Sciences Alazhar University Cairo Egypt 

出 版 物：《Journal of Modern Physics》 (现代物理（英文）)

年 卷 期：2014年第5卷第8期

页      面：591-598页

学科分类：1002[医学-临床医学] 100214[医学-肿瘤学] 10[医学] 

主　　题：RF-Discharge Self-Consistent Model Ohmic Heating 

摘      要：Numerical calculations by using a self-consistent model of the collisional sheath for the capacitively coupled RF discharge are our target. The results indicated that, at high pressure, the ohmic heating is usually the dominant heating mechanism in the discharge. The power dissipated in the sheath is calculated and compared with the measured data. Moreover, we indicated that, when the gas pressure is increased, the calculated dissipated power is decreased also while the measured input RF power is increased. Furthermore the sheath thickness of the capacitively coupled discharge is calculated and in the same order of the electron oscillation amplitude in the RF field, while the ionization mean free path is shorter than it.