CNx Films Deposited by Laser Ablation of Graphite Under Low Energy Nitrogen-Ion Beam Bombardment

作     者：REN Zhongmin XIONG Xiaxing DU Yuancheng WU Jiada YING Zhifeng QIU Yuanxun LI Fuming 

作者机构：State Key Joint Laboratory for Material Modification by LaserIon and Electron BeamsFudan UniversityShanghai 200433 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：1994年第11卷第7期

页      面：461-464页

核心收录：

学科分类：08[工学] 080502[工学-材料学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：amorphous fir Graphite 

摘      要：Deposition of CN_(x) thin films on Si(111)has been performed by laser ablation of graphite under a low-energy nitrogen ion beam *** with a maximum N-concentration of 34%are *** N species is found to be relatively constant along the depth of films.X-ray spectroscopy data confirm the existence of covalent C-N *** structure has been detected in the amorphous matrix of the *** hardness tests indicate that the films are relatively hard and adhesive.