Electron Field Emission from Different sp3 Content Diamond-Like Carbon Films
从像钻石的碳拍摄的不同 sp3 内容的电子地排放作者机构:Ion Beam LaboratoryShanghai Institute of MetallurgyChinese Academy of SciencesShanghai 200050 Department of Electronics Science and TechnologyEast China Normal UniversityShanghai 200062
出 版 物:《Chinese Physics Letters》 (中国物理快报(英文版))
年 卷 期:1999年第16卷第2期
页 面:152-154页
核心收录:
学科分类:0809[工学-电子科学与技术(可授工学、理学学位)] 07[理学] 070205[理学-凝聚态物理] 08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学] 0702[理学-物理学]
基 金:Supported by the 863 Program of the National Science and Technology Committee of China
主 题:structure. deposition. theory.
摘 要:Different sp^(3) content diamond-like carbon films are deposited on to highly n-doped Si(111)substrates by a new plasma deposition technique-filtered arc *** electron field emission properties are studied by using a simple diode *** is showed that the turn-on field is decreased and field emission current density is increased with the increasing sp3 content(75-80%,80-83%,and 88-90%)of the *** emission current of 0.1μA from the three samples was detected under the electric field of 10.1,5.6,and 2.9 V/μm and emission current density of 4.4,15.2,and 43.2μA/cm^(2),respectively,under 14.3 V/μ***-Nordheim(F-N)plots of the three samples nearly show of lineaity indicating that electron field emission obeys F-N theory.