Application of Plasma Enhanced Chemical Vapor Deposition for Fingerprint Resistance

作     者：Lei Wenwen Chen Qiang Qi Fengyang Yang Lizhen Liu Zhongwei Wang Zhengduo 

作者机构：Beijing Inst Graph Commun Lab Plasma Phys & Mat Beijing 102600 Peoples R China 

出 版 物：《稀有金属材料与工程》 (Rare Metal Materials and Engineering)

年 卷 期：2012年第41卷第S1期

页      面：433-438页

核心收录：

学科分类：08[工学] 080502[工学-材料学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：Beijing Natural Science Foundation(No.1112012) KM201110015008 KM201010015005 and PHR20110516 

主　　题：SiOx and DLC coatings CCP fingerprint resistance corrosion resistance 

摘      要：SiOx and diamond-like carbon(DLC)coatings as the fingerprint resistance and corrosion resistance layers were deposited by capacitively coupled plasma(CCP)-enhanced chemical vapor deposition powered by radio frequency(RF-PECVD).In here hexamethyldisiloxane(HMDSO)as monomer for SiOx coating,C2H2 as the carbon source for DLC growth precursor,and Ar as the dilution gas were *** important factors affected fingerprint resistance was explored in ***,the corrosion resistant test on coatings and substrates were then examined by the potentiodynamic polarization measurement and salt-spray corrosion test,*** chemical structure and composition of SiOx and DLC films were analyzed by FTIR,and the relationship between them and anti-corrosion property was *** results show that the DLC coating demonstrates a better anti-fingerprint behavior than that of coated SiOx,especially in acidic solution environment.