New Laser Interferometer with OPD Multiplication for Nanometer Measurement

作     者：ZHAO Meirong QU Xinghua WANG Hailong LU Boyin(State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University, Tianjin 300072, China) 

作者机构：天津大学 精密测试技术及仪器国家重点实验室 天津 

出 版 物：《Chinese Journal of Lasers》 (中国激光(英文版))

年 卷 期：1999年第8卷第5期

页      面：3-5页

核心收录：

学科分类：0808[工学-电气工程] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0803[工学-光学工程] 0702[理学-物理学] 

主　　题：nanometer nanometroolgy laser interferometer displacement measurement differential interfrometry OPD multiplication 

摘      要：By using coupled differential interferometry a new laser displacement measurement interferometer with nanometric accuracy has been developed The resolution and the stability of the interferometer are improved by multiplicating the optical path difference (OPD). The new interferometer is simple in concept, symmetric in optical paths, without optical deadpath, easy to set up and align. λ/1600 resolution and nanometric accuracy are achieved within the measurement range of 10mm.