Resistance Behaviour of Nanocrystal Nickel

作     者：Jirong SUN Yingzi ZHANG Guanghui RAO Yong LIU Shichao LIU Institute of Physics,Academia Sinica,Beijing,100090,China 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：1993年第9卷第3期

页      面：185-189页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

主　　题：nanocrystal interface grain boundary relaxation resistance electronic structure 

摘      要：The resistance behaviour of nanocrystal nickel was studied from 4 to 720 K and 0 to 20 Kbar.A linear variation of the resistance was found at low *** showed that under high temperatures, that system transformed to a more stable state,with the relaxation process taking place by stages and influenced by exerted *** property,especially the stability,of nanocrystal was closely re- lated to the compacting pressure,