Synthesis and Properties of UV-curable Hyperbranched Polyurethane and Its Application in the Negative-type Photoresist
Synthesis and Properties of UV-curable Hyperbranched Polyurethane and Its Application in the Negative-type Photoresist作者机构:School of Chemical and Material Engineering Jiangnan University
出 版 物:《Journal of Wuhan University of Technology(Materials Science)》 (武汉理工大学学报(材料科学英文版))
年 卷 期:2014年第29卷第1期
页 面:208-212页
核心收录:
学科分类:08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学] 0702[理学-物理学]
基 金:Funded by the National Natural Science Foundation of China(Nos.51203063 51103064)
主 题:UV-curable hyperbranched polyurethane photoresist
摘 要:UV-curable hyperbranched polyurethane (UV-HBPU) containing carboxyl groups was synthesized from isophorone diisocyanate (IPDI), diethanolamine (DEOA), polyethylene glycol (PEG-400), hydroxyethyl acrylate (HEA), and 2,2-his (hydroxymethyl) propionic acid (DMPA). The UV-HBPU was used as a negative-type photoresist for a printed circuit board (PCB). Fourier-transform infrared spectroscopy (FTIR) and proton nuclear magnetic resonance (1HNMR) spectroscopy of UV-HBPUs indicated that the synthesis was successful. Differential scanning calorimetry (DSC) and thermogravimetric analysis (TGA) showed that the thermal stability of the UV-HBPUs decreased as the HEA content increased. The polymer exhibited excellent photoresist properties, and the resolution of circuits based on this negative-type photoresist reached 10 μm.