A New Approach for Preparing Effective Inhibition Film on Copper Based on Self-assembled Process

作     者：Chun Tao Shen Hao CHEN 

作者机构：DepartmentofChemistryShandongUniversityJinan250100 StateKeylaboratoryforCorrosionandProtectionShenyang110015 

出 版 物：《Chinese Chemical Letters》 (中国化学快报（英文版）)

年 卷 期：2003年第14卷第3期

页      面：308-311页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：Subsidized with the Special Funds for the Major State Basic Research Projects G19990650 and the Chinese National Science Fund (No. 20173033) 

主　　题：Self-assembly phenylthiourea (PT) 1-dodecanethiol (DT) AC voltage. 

摘      要：A new method for preparing effective inhibition film on copper has been developed. Phenylthiourea (PT) was first absorbed to copper surface to form a monolayer. 1-Dodecanethiol (DT) was then assembled on the surface for modification. Finally, AC voltage was loaded on copper covered the mixed film to improve it further. After these processes, an effective inhibition film was gained because of its high charge transfer resistance and low corrosion current density shown in electrochemical impedance spectra and polarization. The inhibition efficiency was more than 97%.