Unidirectional p-GaN gate HEMT with composite source-drain field plates
Unidirectional p-GaN gate HEMT with composite source-drain field plates作者机构:Key Lab of Ministry of Education for Wide Band-Gap Semiconductor Materials and DevicesSchool of Microelectronics Xidian University
出 版 物:《Science China(Information Sciences)》 (中国科学:信息科学(英文版))
年 卷 期:2022年第65卷第2期
页 面:265-266页
核心收录:
学科分类:080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学]
基 金:supported in part by the Key Research and Development Program of Shaanxi (Grant No. 2020ZDLGY03-05) Key-Area Resarch and Development Program of Guangdong Province (Grant No. 2020B010174001) National Natural Science Foundation of China (Grant Nos. 61574112, 61974115)
主 题:Nano CMOS ESD Reliability Hot-carrier Charge trapping
摘 要:Dear editor,Ga N-on-Si high electron mobility transistors (HEMTs) have attracted attention for power device applications due to their low cost and large-area availability[1].Recently,bidirectional switches are highly desirable in many industrial bidirectional power conversion applications,such as rolling mills,elevators,and wind power *** addition,normally-off unidirectional HEMTs can be valuable devices to implement the high-performance bidirectional switches[2,3].