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检索条件"机构=Sputtered Films Incorporated"
18 条 记 录,以下是1-10 订阅
排序:
CARBON films PREPARED BY S-GUN MAGNETRON SPUTTERING USING GRAPHITE TARGET
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真空科学与技术学报 1992年 第Z1期23卷 155-158页
作者: A.P.Clarke P.J.Clarke sputtered films Inc. U.S.A Sputtered Films Inc. U.S.A
Thin amorphous films of Carbon have been deposited by DC S-gun magnetron sputtering using a *** thickness of films in the range of 100 to 200nm were depositod over a pressure range of 0.4 to 8.0 mtorr (Ar fiow rate in... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
High-performance piezoresistive sensors based on transfer-free large-area PdSe_(2) films for human motion and health care monitoring
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InfoMat 2024年 第1期6卷 139-149页
作者: Rui Zhang Jie Lin Tao He Jiafang Wu Zhuojun Yang Liwen Liu Shaofeng Wen Yimin Gong Haifeng Lv Jing Zhang Yi Yin Fangjia Li Changyong Lan Chun Li State Key Laboratory of Electronic Thin films and Integrated Devices School of Optoelectronic Science and EngineeringUniversity of Electronic Science and Technology of ChinaChengduthe People's Republic of China School of Physics University of Electronic Science and Technology of ChinaChengduthe People's Republic of China Sichuan Academy of Medical Sciences and Sichuan People's Hospital Chengduthe People's Republic of China School of Medicine University of Electronic Science and Technology of ChinaChengduthe People's Republic of China
Two-dimensional transition metal dichalcogenides(TMDs)are needed in highperformance piezoresistive sensors due to their strong strain-induced bandgap modification and thereby large gauge ***,integrating a conventional... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
反应溅射TiW_yN_x薄膜扩散势垒特性研究
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Journal of Semiconductors 1993年 第11期14卷 702-707,T001页
作者: 张国炳 武国英 徐立 郝一龙 隋小平 A.P.Clarke P.J.Clarke M.D.Strathman T.Gates S.Baumann 北京大学微电子学研究所 北京100871 sputtered films incorporated USA Chales Evans & Associates USA
本文利用XRD、RBS、AES、SEM和电学测量技术系统地研究了反应溅射制备的TiW_yN_x薄膜的组份、结构和扩散势垒特性,实验结果表明,膜的组份、结构和特性受溅射时N_2流量影响和溅射功率的影响,这种TiW_yN_x膜经550℃30分钟退火后,仍能有效... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Co-occurrence of Dominant Direct and Indirect Transitions in Low Temperature sputtered Indium Tin Oxide Thin films on Polymers
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Chinese Physics Letters 2010年 第8期27卷 186-189页
作者: 殷学松 唐武 翁小龙 邓龙江 State Key Laboratory of Electronic Thin films and Integrated Devices University of Electronic Science and Technology of China Chengdu 610054
Indium tin oxide (ITO) layers are prepared on polymethylmethacrylate and polyethylene terephthalate by rf- magnetron sputtering at room temperature. Their 3D-AFM images and visible transmittance spectra are contrast... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
Effect of Al_2O_3 Buffer Layers on the Properties of sputtered VO_2 Thin films
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Nano-Micro Letters 2017年 第3期9卷 52-59页
作者: Dainan Zhang Tianlong Wen Ying Xiong Donghong Qiu Qiye Wen State Key Laboratory of Electronic films and Integrated Devices University of Electronic Science and Technology of China Department of Electrical and Computer Engineering University of Delaware
VO_2 thin films were grown on silicon substrates using Al_2O_3 thin films as the buffer layers. Compared with direct deposition on silicon, VO_2 thin films deposited on Al_2O_3 buffer layers experience a significant i... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Fabrication and Properties of DC Magnetron sputtered Indium Tin Oxide on Flexible Plastic Substrate
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Journal of Materials Science & Technology 2009年 第1期25卷 119-122页
作者: Hui Lin Junsheng Yu Nana Wang Shuangling Lou Yadong Jiang State Key Laboratory of Electronic Thin films and Integrated Devices School of Optoelectronic Information University of Electronic Science and Technology of China (UESTC) Chengdu 610054 China
Indium tin oxide (ITO) thin films deposited on flexible polyethylene terephthalate (PET) substrates at low temperature by DC magnetron sputtering from an In-Sn (90-10 wt pct) alloy target were studied. The corre... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Optical and electrical properties of InGaZnON thin films
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Chinese Physics B 2020年 第1期29卷 475-481页
作者: Jian Ke Yao Fan Ye Ping Fan Shenzhen Key Laboratory of Advanced Thin films and Applications College of Physics and EnergyShenzhen UniversityShenzhen 518060China
The substrate temperature(Ts)and N2 partial pressure(PN2)dependent optical and electrical properties of sputtered InGaZnON thin films are *** the increased Ts and PN2,the thin film becomes more crystallized and *** Ha... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Numerical shaper optimization for sputtered optical precision filters
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Chinese Optics Letters 2013年 第13期11卷 36-39页
作者: Andreas Pflug Michael Siemers Thomas Melzig Daniel Rademacher Tobias Zickenrott Michael Vergohl Fraunhofer Institute for Surface Engineering and Thin films IST Bienroder Weg 54e 38108 Braunschweig Germany
A novel optimization procedure for optical precision sputter coaters with respect to the film homogeneity is demonstrated. For a coater concept based on dual cylindrical sputtering sources and a rotating turn-table as... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
Metal Organic Deposition of Lanthanum Zirconate Buffer Layer on Biaxially Textured Ni-5%W Substrate
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稀有金属材料与工程 2011年 第S3期40卷 306-310页
作者: Guo Pei, Zhao Xiaohui, Xiong Jie, Xia Yudong, Jing Tongguo, Chen Jue,Zhang Ning, Zhang Fei, Tao Bowan, Li Yanrong State Key Laboratory of Electronic Thin films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu,610054,China Univ Elect Sci & Technol China State Key Lab Elect Thin Films & Integrated Devic Chengdu 610054 Peoples R China
In this study,a simple template consisted of Y2O3 and La2Zr2O7 (LZO) layers was fabricated on rolling assisted biaxially textured Ni-5at%W substrates for YBa2Cu3O7-δ (YBCO) coated conductors.A thin sputtered Y2O3 lay... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论
Etching mechanism of barium strontium titanate (BST) thin films in CHF_3/Ar plasma
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Chinese Science Bulletin 2011年 第21期56卷 2267-2271页
作者: DAI LiPing WANG ShuYa SHU Ping ZHONG ZhiQin WANG Gang ZHANG GuoJun State Key Laboratory of Electronic Thin films and Integrated Devices University of Electronic Science and Technology of ChinaChengdu 610054China
Reactive ion etching was used to etch barium strontium titanate thin films in a CHF3/Ar *** surfaces before and after etching were analyzed by X-ray photoelectron spectroscopy to investigate the reaction ion etching m... 详细信息
来源: 维普期刊数据库 维普期刊数据库 同方期刊数据库 同方期刊数据库 评论