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Effect of Free Radicals on Irradiation Chemistry of a Double-Coordination Organotin(Sn_(4))Photoresist by Adjusting Alkyl Ligands

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CCS Chemistry 2024年第8期6卷 2044-2053页

作者： Hao Chen Yifeng Peng Haichao Fu Fuping Han Guangyue Shi Feng Luo Jun Zhao Danhong Zhou Pengzhong Chen Xiaojun Peng State Key Laboratory of Fine Chemicals Frontiers Science Center for Smart MaterialsSchool of Chemical EngineeringDalian University of TechnologyDalian 116024 Research and Development Center of Valiant Co. Ltd.YEDAYantai 264006 School of Materials Science and Engineering Nankai UniversityTianjin 300350 Shanghai Advanced Research Institute Chinese Academy of SciencesShanghai 201203 State Key Laboratory of Fine Chemicals College of Materials Science and EngineeringShenzhen UniversityShenzhen 518060

Metal oxide cluster(MOC)photoresists are highly promising materials for the next generation of extreme ultraviolet lithography(EUVL).The consecutive exploration of novel MOC materials and their structural irradiation chemistry are the major concerns associated with ***,we report two bicoordinated tin-oxo clusters(TOCs),the organic ligands of which contain both adamantane carboxylic acids and alkyl groups(methyl:Sn_(4)–Me–C10;butyl:Sn_(4)–Bu–C10).We explore the correlation between the structures of the TOCs and their patterning properties by adjusting the alkyl groups coordinated to the Sn *** structural variation causes different irradiation chemistry,with Sn_(4)–Me–C10 exhibiting improved resolution and Sn_(4)–Bu–C10 demonstrating higher *** differences are attributed to the bonding energies of the Sn-methyl and Sn-butyl groups,the size of the resulting alkyl radicals,and their reaction *** clusters occur in the reactions of Sn–C bond cleavage and the decarboxylation of adamantane carboxylic acids upon ***,the entire process exhibits distinct *** on the electron-beam lithography and other experiments,we proposed irradiationinduced reaction mechanisms for both *** Sn_(4)–Bu–C10 cluster predominantly undergoes alkane chain linkage,whereas the Sn_(4)–Me–C10 cluster mainly follows the adamantanes linkage pathway.

关键词： extreme ultraviolet photoresist tin-oxo clusters free radical alkyl ligand lithographic process semiconductor manufacturing

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