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Effect of oxygen terminated surface of boron-doped diamond thin-film electrode on seawater salinity sensing

Journal of Materials Science & Technology 2021年第27期86卷 1-10页

作者： Dan Shi Lusheng Liu Zhaofeng Zhai Bin Chen Zhigang Lu Chuyan Zhang Ziyao Yuan Meiqi Zhou Bing Yang Nan Huang Xin jiang Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of SciencesShenyang110016China School of Materials Science and Engineering University of Science and Technology of ChinaShenyang110016China Institute of Materials Engineering University of SiegenPaul-Bonatz-Str.9-11Siegen57076Germany

Tremendous demands for highly sensitive and stable seawater salinometers have motivated intensive research on advanced electrode ***-doped diamond(BDD)is attractive in terms of its high mechanical stability and chemical inertness,but is usually hindered by its low double-layer capacitance(C_(dl))for seawater salinity ***,inspired by the principle of oxygen-terminated BDD electrode endowing higher C_(dl)than hydrogen-terminated surface,we introduce the oxygen terminated surface by oxygen plasma or reactive ion etch(RIE),and the fabricated oxygen terminated BDD electrodes demonstrate high sensitivity and long-term stability in seawater salinity detection comparing with the hydrogen terminated BDD ***,the as-fabricated O-BDD-RIE electrodes not only show remarkable enhanced response even better than the commercial platinum black electrodes but also display long-time stability which is weekly verified by continuous monitor for 90 *** outstanding performance of the oxygen terminated BDD electrodes can be ascribed to the enhancement of C-O surface functional group on C_(dl).In addition,a comprehensive analysis of effective electroactive surface area(EASA)and C_(dl)proves that the surface oxygen is the major factor for the improved C_(dl).In summary,the excellent oxygen terminated BDD electrodes promise potential application in seawater salinity detection.

关键词： Boron-doped diamond Capacitance Oxygen plasma reactive ion etch Seawater salinity

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Fast patterning and dry-etch of SiN_x for high resolution nanoimprint templates

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Journal of Semiconductors 2009年第6期30卷 138-141页

作者：疏珍万景陆冰睿谢申奇陈宜方屈新萍刘冉 State Key Laboratory of ASIC and System Department of Microelectronics Fudan University Micro and Nanotechnology Centre Rutherford Appleton Laboratory Chilton Didcot Oxon OX11 0QX UK

We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography（EBL） and a dry etch technique on a SiNx substrate,intended for large area *** this end,the highly sensitive chemically amplified resist（CAR）,NEB-22,with negative tone was *** EBL process first defines the template pattern in NEB-22,which is then directly used as an etching mask in the subsequent reactive ion etching（RIE） on the SiNx to form the desired *** properties of both e-beam lithography and dry etch of NEB-22 were carefully studied,indicating significant advantages of this process with some drawbacks compared to when Cr was used as an etching ***,our results open up a good opportunity to fabricate high resolution imprint templates with the prospect of wafer scale manufacturing.

关键词： SiNx templates nanoimprint NEB-22 electron bean lithography reactive ion etch

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