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Fabrication and integration of photonic devices for phase-change memory and neuromorphic computing

International Journal of Extreme Manufacturing 2024年第2期6卷 2-27页

作者： Wen Zhou Xueyang Shen Xiaolong Yang Jiangjing Wang Wei Zhang Center for Alloy Innovation and Design(CAID) State Key Laboratory for Mechanical Behavior of MaterialsXi’an Jiaotong UniversityXi’an 710049People’s Republic of China

In the past decade,there has been tremendous progress in integrating chalcogenide phase-change materials(PCMs)on the silicon photonic platform for non-volatile memory to neuromorphic in-memory computing applications.In particular,these non von Neumann computational elements and systems benefit from mass manufacturing of silicon photonic integrated circuits(PICs)on 8-inch wafers using a 130 nm complementary metal-oxide semiconductor line.Chip manufacturing based on deep-ultraviolet lithography and electron-beam lithography enables rapid prototyping of PICs,which can be integrated with high-quality PCMs based on the wafer-scale sputtering technique as a back-end-of-line process.In this article,we present an overview of recent advances in waveguide integrated PCM memory cells,functional devices,and neuromorphic systems,with an emphasis on fabrication and integration processes to attain state-of-the-art device performance.After a short overview of PCM based photonic devices,we discuss the materials properties of the functional layer as well as the progress on the light guiding layer,namely,the silicon and germanium waveguide platforms.Next,we discuss the cleanroom fabrication flow of waveguide devices integrated with thin films and nanowires,silicon waveguides and plasmonic microheaters for the electrothermal switching of PCMs and mixed-mode operation.Finally,the fabrication of photonic and photonic–electronic neuromorphic computing systems is reviewed.These systems consist of arrays of PCM memory elements for associative learning,matrix-vector multiplication,and pattern recognition.With large-scale integration,the neuromorphic photonic computing paradigm holds the promise to outperform digital electronic accelerators by taking the advantages of ultra-high bandwidth,high speed,and energy-efficient operation in running machine learning algorithms.

关键词： nanofabrication silicon photonics phase-change materials non-volatile photonic memory neuromorphic photonic computing

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Advanced manufacturing of dielectric metadevices

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Photonics Insights 2024年第2期3卷 31-70页

作者： Wenhong Yang Junxiao Zhou Din Ping Tsai Shumin Xiao Key Lab of Micro-Nano Optoelectronic Information System Ministry of Industry and Information TechnologyGuangdong Provincial Key Laboratory of Semiconductor Optoelectronic Materials and Intelligent Photonic SystemsHarbin Institute of TechnologyShenzhenChina Department of Electrical Engineering City University of Hong KongHong KongChina The State Key Laboratory of Terahertz and Millimeter Waves City University of Hong KongHong KongChina Centre for Biosystems Neuroscienceand NanotechnologyCity University of Hong KongHong KongChina Pengcheng Laboratory ShenzhenChina

Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.

关键词： dielectric meta-devices meta-optics metasurface nanofabrication nanotechnology nanophotonics large/waferscale nanofabrication

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Ice lithography for 3D nanofabrication

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Science Bulletin 2019年第12期64卷 865-871页

作者： Ding Zhao Anpan Han Min Qiu National Centre for Nano Fabrication and Characterization Technical University of DenmarkKongens Lyngby2800Denmark Department of Mechanical Engineering Technical University of DenmarkKongens Lyngby2800Denmark Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province School of EngineeringWestlake UniversityHangzhou 310024China Institute of Advanced Technology Westlake Institute for Advanced StudyHangzhou 310024China

Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography, which makes 2 D patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication.Recently, significant progress in 3 D electron-beam-based nanofabrication has been made, such as the emerging ice lithography technology, in which ice thin-films are patterned by a focused electronbeam. Here, we review the history and progress of ice lithography, and focus on its applications in efficient 3 D nanofabrication and additive manufacturing or nanoscale 3 D printing. The finest linewidth made using frozen octane is below 5 nm, and nanostructures can be fabricated in selected areas on non-planar surfaces such as freely suspended nanotubes or nanowires. As developing custom instruments is required to advance this emerging technology, we discuss the evolution of ice lithography instruments and highlight major instrumentation advances. Finally, we present the perspectives of 3 D printing of functional materials using organic ices. We believe that we barely scratched the surface of this new and exciting research area, and we hope that this review will stimulate cutting-edge and interdisciplinary research that exploits the undiscovered potentials of ice lithography for 3 D photonics, electronics and 3 D nanodevices for biology and medicine.

关键词： Nanotechnology nanofabrication Electron-beam lithography Ice lithography 3D nanofabrication Additive manufacturing Organic ice

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Nanoimprint Lithography:A Processing Technique for nanofabrication Advancement

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Nano-Micro Letters 2011年第2期3卷 135-140页

作者： Weimin Zhou Guoquan Min Jing Zhang Yanbo Liu Jinhe Wang Yanping Zhang Feng Sun Laboratory of Nanotechnology Shanghai Nanotechnology Promotion Center (SNPC)

Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.

关键词： Nanoimprint lithography Soft molecular scale nanofabrication

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Tip-and Laser-based 3D nanofabrication in Extended Macroscopic Working Areas

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Nanomanufacturing and Metrology 2021年第3期4卷 132-148页

作者： Ingo Ortlepp Thomas Frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstrasse 2998693 IlmenauGermany Control Engineering Group Technische Universitat IlmenauIlmenauGermany Optical Engineering Group.Technische Universitat Ilmenau IlmenauGermany Microsystems Technology Group.Technische Universitat Ilmenau IlmenauGermany Precision Engineering Group.Technische Universitat Ilmenau IlmenauGermany Compliant Systems Group Technische Universitat IlmenauIlmenauGermany Micro-and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group.Technische Universitat Ilmenau IlmenauGermany Division for Research Service and Technology Transfer Technische Universitat IlmenauIlmenauGermany Electronics Technology Group.Technische Universitat Ilmenau IlmenauGermany IMMS Institut flir Mikroelektronik-und Mechatronik-Systeme Gemeinniitzige GmbH(IMMS GmbH) IlmenauGermany Fachgebiet Technische Physik City University of Applied SciencesBremenGermany Lehrstuhl fiir Fertigungsmesstechnik Friedrich-Alexander-U niversitat(FAU)Erlangen-NiirnbergGermany JUMO GmbH&Co.KG FuldaGermany Asphericon GmbH JenaGermany

The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies.This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning technologies.International society for optics and photonics.SPIE,Bellingham,2021.https://***/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication technologies.Yet,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square micrometers.Such scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies.Similar challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life sciences.Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)machines.With this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.

关键词： Nanomeasuring Nanopositioning Nanomanufacturing Scale-spanning Tip-based Laser-based nanofabrication

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Advances in diamond nanofabrication for ultrasensitive devices

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Microsystems & Nanoengineering 2017年第1期3卷 80-95页

作者： Stefania Castelletto Lorenzo Rosa Jonathan Blackledge Mohammed Zaher Al Abri Albert Boretti School of Engineering RMIT UniversityBundooraVictoria 3083Australia Swinburne University of Technology Centre for Micro-Photonics(H74)HawthornVictoria 3122Australia Department of Information Engineering University of ParmaParma 43121Italy Military Technological College Muscat 111Sultanate of Oman Dublin Institute of Technology Rathmines RoadDublin 6Ireland Department of Petroleum and Chemical Engineering Sultan Qaboos UniversityPO Box 33Al-KhoudMuscat 123Sultanate of Oman Water Research Center Sultan Qaboos UniversityPO Box 17Al-KhoudMuscat 123Sultanate of Oman Department of Mechanical and Aerospace Engineering Benjamin M.Statler College of Engineering and Mineral ResourcesWest Virginia UniversityP.O.Box 6106325 Engineering Sciences BuildingMorgantownWV 26506USA

This paper reviews some of the major recent advances in single-crystal diamond nanofabrication and its impact in nano-and micromechanical,nanophotonics and optomechanical components.These constituents of integrated devices incorporating specific dopants in the material provide the capacity to enhance the sensitivity in detecting mass and forces as well as magnetic field down to quantum mechanical limits and will lead pioneering innovations in ultrasensitive sensing and precision measurements in the realm of the medical sciences,quantum sciences and related technologies.

关键词： nano-diamonds nanofabrication nanomechanics nanophotonics optomechanics

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Localised solid-state nanopore fabrication via controlled breakdown using on-chip electrodes

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Nano Research 2022年第11期15卷 9881-9889页

作者： Jasper P.Fried Jacob L.Swett Binoy Paulose Nadappuram Aleksandra Fedosyuk Alex Gee Ondrej E.Dyck James R.Yates Aleksandar P.Ivanov Joshua B.Edel Jan A.Mol Department of Materials University of OxfordOxfordOX13PHUK School of Chemistry University of New South WalesSydneyNew South Wales 2052Australia Department of Chemistry Imperial College LondonLondonW120BZUK Center for Nanophase Materials Sciences Oak Ridge National LaboratoryOak RidgeTN 37830USA Instituto de Tecnologia Química e Biológica António Xavier Universidade Nova de LisboaAv.da RepúblicaOeiras 2780-157Portugal School of Physics and Astronomy Queen Mary University of LondonLondonE14NSUK

Controlled breakdown has recently emerged as a highly accessible technique to fabricate solid-state nanopores.However,in its most common form,controlled breakdown creates a single nanopore at an arbitrary location in the membrane.Here,we introduce a new strategy whereby breakdown is performed by applying the electric field between an on-chip electrode and an electrolyte solution in contact with the opposite side of the membrane.We demonstrate two advantages of this method.First,we can independently fabricate multiple nanopores at given positions in the membrane by localising the applied field to the electrode.Second,we can create nanopores that are self-aligned with complementary nanoelectrodes by applying voltages to the on-chip electrodes to locally heat the membrane during controlled breakdown.This new controlled breakdown method provides a path towards the affordable,rapid,and automatable fabrication of arrays of nanopores self-aligned with complementary on-chip nanostructures.

关键词： solid-state nanopores dielectric breakdown nanofabrication single-molecule sensing nanopore arrays

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A dynamic infiltration technique to synthesize nanolayered cathodes for high performance and robust solid oxide fuel cells

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Journal of Energy Chemistry 2022年第7期31卷 201-210,I0006页

作者： Saeed Ur Rehman Ho-Seon Song Hye-Sung Kim Muhammad Haseeb Hassan Dong-Woo Joh Rak-Hyun Song Tak-Hyoung Lim Jong-Eun Hong Seok-Joo Park Seung-Bok Lee High Temperature Energy Conversion Laboratory Korea Institute of Energy Research152Gajeong-roYuseong-gu.Daejeon34129.Republic of Korea Department of Advanced Energy and System Engineering University of Science and Technology.217 Gajeong-ro.Yuseong-gu.Daejeon 34113.Republicof Korea

Solution infiltration is a popular technique for the surface modification of solid oxide fuel cell(SOFC)cathodes.However,the synthesis of nanostructured SOFC cathodes by infiltration is a tedious process that often requires several infiltration and high temperature(≥500℃)calcination cycles.Moreover,fabricating large-area nanostructured cathodes via infiltration still requires serious attention.Here,we propose a facile and scalable urea assisted ultrasonic spray infiltration technique for nanofabrication of SOFC cathodes.It is demonstrated that by using urea as a precipitating agent,the calcination after each infiltration cycle can be omitted and the next infiltration can be performed just after a drying step(≤100℃).Finally,the precipitates can be converted into a desired catalyst phase in single calcination thus,a nanostructured cathode can be fabricated in a much faster manner.It is also shown that the low calcination temperature of the cathode(≤900℃)can produce highly durable SOFC performance even without employing a Ce_(0.9)Gd_(0.1)O_(2)(GDC)diffusion barrier layer which provides the ease of SOFC fabrication.While coupling with an ultrasonic spray technique,the urea assisted infiltration can be scaled up for any desired cathode area.La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_(3) nanolayered cathode was fabricated and it was characterized by scanning electron microscope(SEM),X-ray diffraction(XRD),and transmission electron microscopy(TEM)techniques.SEM showed the formation of a nanolayer cathode just after 5 cycles of the urea assisted infiltration while the XRD and TEM confirmed the phase and stoichiometric uniformity of the 100 nm cathode nanolayer.The effectiveness of the newly developed technique was further verified by the stable operation of a GDC buffer layer free SOFC having an active cathode area of 25 cm^(2) during a 1200 h durability test.The research outcomes propose urea assisted ultrasonic spray infiltration as a facile,scalable,and commercially viable method for the fabrication of durable nanostructured S

关键词： Solid oxide fuel cell(SOFC) Cathode Infiltration Nanolayer nanofabrication GDC barrier layer free SOFC

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Unconventional 2D Periodic Nanopatterns Based on Block Molecules

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高分子科学:英文版 2023年第10期41卷 1508-1524页

作者： Bo Hou Wen-Bin Zhang Yu Shao Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry&Physics of Ministry of EducationCenter for Soft Matter Science and EngineeringCollege of Chemistry and Molecular EngineeringPeking UniversityBeijing100871China

This review summarizes the self-assembly of block molecules forming unconventional two-dimensional(2D)periodic nanopatterns.Especially,we emphasize the structural evolution from simple columnar phases to complex 2D tiling morphologies in soft materials including block copolymers,liquid crystals,giant molecules,etc.Then,the state-of-the-art nanofabrication technologies for making sophisticated nanostructures with specific functions via combining both bottom-up assembly and top-down lithography-based methods are discussed,highlighting the use of directed self-assembly processes.Finally,we provide our perspective on this area.By further increasing the complexity of block molecules and the designability of lithography,low-dimensional ordered morphologies will be particularly promising for further application in nanotechnology.

关键词： Two-dimensional ordered morphologies Block molecules Directed self-assembly nanofabrication Tilings and patterns

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Research on nanofabrication Technology of Micro-/Nano-Stereo Rapid Prototyping of PCVD

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厦门大学学报（自然科学版） 2002年第S1期41卷 280-页

作者： Sandy TO Ultra-Precision Machining Centre

At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS, energy beam etching and micro/nano-machining, etc. A common problem for t hese processes is the difficulty to fabricate arbitrary form for 3-dimensional micro/nano-parts, devices or mechanisms. To develop advanced MEMS manufacturin g technology, and to achieve fabrication of true 3-dimensional parts, devices or mechanisms, this paper proposes a nanofabrication technology for rapid proto typing of 3-dimensional parts, using plasma chemical vapor deposition (PCVD). This process can be describes as follows: A laser beam is produced by a low power, quasi molecule laser. It enters the vac uum chamber through a window, and is focused on with the substrate surface. A ga s in the chamber is ionized by the laser beam to produce PCVD on the substrate s urface, and forms a particle of the size of Ф100 nm (its thickness is about 100 nm). When the laser beam moves along X-axis, many particles form a line. Then the laser beam moves one step in Y-axis to form a new line. A plane is complete d by many lines. Then the substrate moves in Z-axis to form new plane. Eventu ally, many planes form a 3-dimensional component. Using available CAD/CAM softw are with this process, rapid prototyping of complex components can be achieved. A nanometer precision linear motor, such as that described in Chinese national p atent (patent No. ZL 98 2 16753.9), can be used to obtain the nanometer precisio n movements in the process. The process does not require mask, can be used for v arious rapid prototyping materials, to obtain high fabrication precision (its sc ale precision is 15 nm), and larger ratio of height to width of micro/nano-stru cture. It can find widespread applications in the fabrication of micro-mechani sm, trimming IC, and fabricating minilens, etc.

关键词： plasma nanofabrication rapid prototyping advan ced manufacturing technology micro/nano-technology

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