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检索条件"主题词=microwave plasma chemical vapordeposition"
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Growth of 4" diameter polycrystailine diamond wafers with high thermal conductivity by 915 MHz microwave plasma chemical vapor deposition
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plasma Science and Technology 2017年 第3期19卷 93-97页
作者: A F POPOVICH V G RALCHENKO V K BALLA A K MALLIK A A KHOMICH A P BOLSHAKOV D N SOVYK E E ASHKINAZI V Yu YUROV Institute of Radio Engineering and Electronics of Russian Academy of Sciences Fryazino 141190 Russia General Physics Institute of Russian Academy of Sciences Moscow 119991 Russia Harbin Institute of Technology Harbin 150001 People's Republic of China National Research Nuclear University MEPhI Moscow 115409 Russia Central Glass and Ceramic Research Institute Kolkata 700 032 India
Polycrystalline diamond(PCD) films 100 mm in diameter are grown by 915 MHz microwave plasma chemical vapor deposition(MPCVD) at different process parameters,and their thermal conductivity(TC) is evaluated by a l... 详细信息
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