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Advanced Photonics 2022年第3期4卷 27-39页

作者： Haoyi Yu Qiming Zhang Xi Chen Haitao Luan Min Gu University of Shanghai for Science and Technology Institute of Photonic ChipsShanghaiChina University of Shanghai for Science and Technology School of Optical-Electrical and Computer EngineeringCentre for Artificial-Intelligence NanophotonicsShanghaiChina

The creation of biomimetic neuron interfaces(BNIs)has become imperative for different research fields from neural science to artificial *** are two-dimensional or three-dimensional(3D)artificial interfaces mimicking the geometrical and functional characteristics of biological neural networks to rebuild,understand,and improve neuronal *** study of BNI holds the key for curing neuron disorder diseases and creating innovative artificial neural networks(ANNs).To achieve these goals,3D direct laser writing(DLW)has proven to be a powerful method for BNI with complex ***,the need for scaled-up,high speed fabrication of BNI demands the integration of DLW techniques with ***,computing algorithms inspired by biological neurons,have shown their unprecedented ability to improve efficiency in data *** integration of ANNs and DLW techniques promises an innovative pathway for efficient fabrication of large-scale BNI and can also inspire the design and optimization of novel BNI for *** perspective reviews advances in DLW of BNI and discusses the role of ANNs in the design and fabrication of BNI.

关键词： direct laser writing neuron interface neural tissue engineering artificial neural networks.

direct laser writing of graphene oxide for ultra-low power consumption memristors in reservoir computing for digital recognition

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National Science Open 2022年第3期1卷 46-58页

作者： Min Chen Zhengfen Wan Hao Dong Qinyu Chen Min Gu Qiming Zhang Institute of Photonic Chips University of Shanghai for Science and TechnologyShanghai 200090China Centre for Artificial-Intelligence Nanophotonics School of Optical-Electrical and Computer EngineeringUniversity of Shanghai for Science and TechnologyShanghai 200090China

A memristor is a promising candidate of new electronic synaptic devices for neuromorphic ***,conventional memristors often exhibit complex device structures,cumbersome manufacturing processes,and high energy ***-based materials show great potential as the building materials of *** direct laser writing technology,this paper proposes a lateral memristor with reduced graphene oxide(rGO)and Pt as electrodes and graphene oxide(GO)as function *** Pt/GO/rGO memristor with a facile lateral structure can be easily fabricated and demonstrates an ultra-low energy consumption of 200 *** synaptic behaviors are successfully ***,the Pt/GO/rGO memristor array is applied in the reservoir computing network,performing the digital recognition with a high accuracy of 95.74%.This work provides a simple and low-cost preparation method for the massive production of artificial synapses with low energy consumption,which will greatly facilitate the development of neural network computing hardware platforms.

关键词： direct laser writing memristor array graphene oxide reservoir computing

Hybrid 2D–3D optical devices for integrated optics by direct laser writing

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Light(Science & Applications) 2014年第1期3卷 173-181页

作者： Martin Schumann Tiemo Buckmann Nico Gruhler Martin Wegener Wolfram Pernice Institute of Applied Physics and DFG-Center for Functional Nanostructures(CFN) Karlsruhe Institute of Technology(KIT)76131 KarlsruheGermany Institute of Nanotechnology(INT) 76344 Eggenstein-LeopoldshafenGermany

Integrated optical chips have already been established for application in optical *** also offer interesting future perspectives for integrated quantum optics on a *** present,however,they are mostly fabricated using essentially planar fabrication approaches like electron-beam lithography or UV optical *** further design options would arise if one had complete fabrication freedom in regard to the third dimension normal to the chip without having to give up the virtues and the know-how of existing planar fabrication *** a step in this direction,we here use three-dimensional dip-in direct-laser-writing optical lithography to fabricate three-dimensional polymeric functional devices on pre-fabricated planar optical chips containing Si3N4 waveguides as well as grating couplers made by standard electron-beam *** first example is a polymeric dielectric rectangular-shaped waveguide which is connected to Si3N4 waveguides and that is adiabatically twisted along its axis to achieve geometrical rotation of linear polarization on the *** rotator’s broadband performance at around 1550 nm wavelength is verified by polarization-dependent grating *** polarization rotation on the optical chip cannot easily be achieved by other *** second example is a whispering-gallery-mode optical resonator connected to Si_(3)N_(4) waveguides on the chip via polymeric *** mechanically connecting the latter to the disk,we can control the coupling to the resonator and,at the same time,guarantee mechanical stability of the three-dimensional architecture on the chip.

关键词： direct laser writing integrated optics nanophotonic circuits polarization conversion

Two-Photon direct laser writing Beyond the Diffraction Limit Using the Nanopositioning and Nanomeasuring Machine

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Nanomanufacturing and Metrology 2021年第3期4卷 149-155页

作者： Laura Mohr-Weidenfeller Annika-Verena Hacker Carsten Reinhardt Eberhard Manske Microsystems Technology Group Ilmenau University of TechnologyMax-Planck-Ring 12IlmenauGermany Institute for Process Measurement and Sensor Technology Ilmenau University of TechnologyGustav-Kirchhoff-Str.1IlmenauGermany Bremen University of Applied Science Neustadtswall 30BremenGermany

Since the first realization of two-photon direct laser writing(DLW)in Maruo et al.(Opt Lett 22:132-134,1997),the manufacturing using direct laser writing techniques spread out in many laboratories all over the *** materials with different material properties open a new field for micro-and *** achievable structuring resolution using this technique is reported to be sub-100 nm(Paz et *** *** Appl.24:042004,2012),while a smallest linewidth of 25 nm could be shown in Tan et al.(Appl Phys Lett 90:071106,2007).In our approach,the combination of DLW with the nanopositioning and nanomeasuring machine NMM-1 offers an improvement of the technique from the engineering side regarding the ultra-precise positioning(Weidenfeller et *** Adv Fabr Technol Micro/Nano Opt Photon Ⅺ 10544:105440E,2018).One big benefit besides the high positioning resolution of 0.1 nm is offered by the positioning range of 25 mm×25 mm×5 mm(Jager et *** Technisches Messen 67:319-323,2000;Manske et *** Meas Sci Technol 18:520-527,2007).Thus,a trans-scale fabrication without any stitching or combination of different positioning systems is *** immense synergy between the highly precise positioning and the DLW is demonstrated by the realization of resist lines and trenches whose center-to-center distance undergoes the modified diffraction limit for two-photon *** precise positioning accuracy enables a defined distance between illuminated ***,with a comparable huge width of the trenches of 1.655|im due to a low effective numerical aperture of 0.16,a resist line of 30 nm between two written trenches could be *** the interrelationships for achieving such narrow trenches have not yet been clarified,much smaller resist lines and trench widths are possible with this approach in the near future.

关键词： direct laser writing Nanopositioning and nanomeasuring machine Two-photon absorption laser power controlling

Self-limiting laser crystallization and direct writing of 2D materials

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International Journal of Extreme Manufacturing 2019年第1期1卷 139-144页

作者： Zabihollah Ahmadi Baha Yakupoglu Nurul Azam Salah Elafandi Masoud Mahjouri-Samani Electrical and Computer Engineering Department Auburn UniversityAuburnALUnited States of America

direct growth and patterning of atomically thin two-dimensional(2D)materials on various substrates are essential steps towards enabling their potential for use in the next generation of electronic and optoelectronic *** conventional gas-phase growth techniques,however,are not compatible with direct patterning ***,the condensed-phase methods,based on metal oxide deposition and chalcogenization processes,require lengthy processing times and high ***,a novel self-limiting laser crystallization process for direct crystallization and patterning of 2D materials is *** takes advantage of significant differences between the optical properties of the amorphous and crystalline *** laser deposition is used to deposit a thin layer of stoichiometric amorphous molybdenum disulfide(MoS2)film(∼3 nm)onto the fused silica substrates.A tunable nanosecond infrared(IR)laser(1064 nm)is then employed to couple a precise amount of power and number of pulses into the amorphous materials for controlled crystallization and direct writing *** IR laser interaction with the amorphous layer results in fast heating,crystallization,and/or evaporation of the materials within a narrow processing ***,reduction of the midgap and defect states in the as crystallized layers decreases the laser coupling efficiency leading to higher tolerance to process *** deliberate design of such laser 2D material interactions allows the selflimiting crystallization phenomena to occur with increased quality and a much broader processing *** unique laser processing approach allows high-quality crystallization,direct writing,patterning,and the integration of various 2D materials into future functional devices.

关键词： 2D materials direct laser writing laser crystallization

Self-aligned fiber-based dual-beam source for STED nanolithography

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Chinese Optics Letters 2021年第7期19卷 82-86页

作者：陈建陈国梁詹其文 School of Optical-Electrical and Computer Engineering University of Shanghai for Science and TechnologyShanghai 201800China

A fiber-based source that can be exploited in a stimulated emission depletion(STED) inspired nanolithography setup is *** a source maintains the excitation beam pulse, generates a ring-shaped depletion beam, and automatically realizes dual-beam coaxial alignment that is critical for two beam *** mode conversion of the depletion beam is realized by using a customized vortex fiber, which converts the Gaussian beam into a donut-shaped azimuthally polarized *** pulse width and repetition frequency of the excitation beam remain unchanged, and its polarization states can be *** to the simulated point spread function of each beam in the focal region, the full width at half-maximum of the effective spot size in STED nanofabrication could decrease to less than 28.6 nm.

关键词： nanolithography vortex fiber direct laser writing STED controlled fabrication

Plasmon-enhanced nanosoldering of silver nanoparticles for high-conductive nanowires electrodes

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Opto-Electronic Advances 2021年第12期4卷 25-33页

作者： Yuan-Yuan Zhao Xue-Liang Ren Mei-Ling Zheng Feng Jin Jie Liu Xian-Zi Dong Zhen-Sheng Zhao Xuan-Ming Duan ’1Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications Institute of Photonics TechnologyJinan UniversityGuangzhou 511443China Laboratory of Organic NanoPhotonics and CAS Key Laboratory of Bio-Inspired Materials and Interfacial Science Technical Institute of Physics and ChemistryChinese Academy of SciencesBeijing 100190China School of Future Technologies University of Chinese Academy of SciencesYanqihu CampusBeijing 101407China.

The silver nanowires(Ag NWs)electrodes,which consist of incompact Ag nanoparticles(NPs)formed by multi-photon photoreduction,usually have poor *** effective strategy for enhancing conductivity of the Ag NWs elec-trodes is plasmon-enhanced nanosoldering(PLNS)by laser ***,plasmon-enhanced photothermal effect is used to locally solder Ag NPs and then aggregates of these NPs grow into large irregular particles in PLNS ***-nite element method(FEM)simulations indicate that the soldering process is triggered by localized surface plasmon-in-duced electric field enhancement at“hot-spots”.The effectiveness of PLNS for enhancing conductivity depends on laser power density and irradiation *** optimizing the conditions of PLNS,the electrical conductivity of Ag NWs is signific-antly enhanced and the conductivityσs is increased to 2.45×107 S/m,which is about 39%of the bulk *** PLNS of Ag NWs provides an efficient and cost-effective technique to rapidly produce large-area metal nanowire electrodes and capacitors with high conductivity,excellent uniformity,and good flexibility.

关键词： silver nanowires silver nanoparticles direct laser writing laser nanosoldering photothermal effect conductivity

Diffractive photonic applications mediated by laser reduced graphene oxides

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Opto-Electronic Advances 2018年第2期1卷 1-8页

作者： Sicong Wang Xueying Ouyang Ziwei Feng Yaoyu Cao Min Gu Xiangping Li Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications Institute of Photonics Technology Jinan University Guangzhou 510632 China Laboratory of Artificial-Intelligence Nanophotonics and CUDOS (Centre for Ultrahigh bandwidth Devices for OpticalSystems) School of Science RMIT University Melbourne Victoria 3001 Australia

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关键词： graphene oxides nanophotonics direct laser writing

Electro-and photochemical studies of gold (Ⅲ) bromide towards a novel laser-based method of gold patterning

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International Journal of Extreme Manufacturing 2022年第3期4卷 105-111页

作者： Cecily Rosenbaum Matthew Murphy Paul T Lawrence Curtis Sirkoch Stella Rose Schneeberg Kyle Zigner Sarah Morris Ethan Richman Chibuzo Anyanwu Eric Will Clare Wheeler Eric Reed Christopher N LaFratta Department of Chemistry and Biochemistry Bard CollegeAnnandale-on-HudsonNYUnited States of America

In this report, we demonstrate a novel technique for the microscopic patterning of gold by combining the photoreduction of Au^(Ⅲ)Br_(2)^(-)to Au^(Ⅰ)Br_(2)^(-)and the electrochemical reduction of Au^(Ⅰ)Br_(2)^(-)to elemental gold in a single step within solution. While mask-based methods have been the norm for electroplating, the adoption of direct laser writing for flexible, real-time patterning has not been widespread. Through irradiation using a 405 nm laser and applying a voltage corresponding to a selective potential window specific to Au^(Ⅰ)Br_(2)^(-), we have shown that we can locally deposit elemental gold at the focal point of the laser. In addition to demonstrating the feasibility of the technique, we have collected data on the kinetics of the photoreduction reaction in ethanol and have deduced its rate law. We have confirmed the selective deposition of Au^(Ⅰ)Br_(2)^(-) within a potential window through controlled potential electrolysis experiments and through direct measurement on a quartz crystal microbalance. Finally, we have verified local deposition through scanning electron microscopy.

关键词： photolithography direct laser writing electrodeposition gold(Ⅲ)bromide photoreduction

Two-photon photopolymerization directly initiated by spiropyran photochromic molecules

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Light(Advanced Manufacturing) 2023年第1期4卷 12-22页

作者： Dandan Ge Jean Aubard Erell Bodinier Safi Jradi Stéphanie Lau-Truong Nordin Felidj Renaud Bachelot Anne-Laure Baudrion Light nanomaterialsnanotechnologies(L2n)LaboratoryCNRS EMR7004Universitéde Technologie de Troyes12 rue Marie Curie10004 Troyes CedexFrance UniversitéParis Cité CNRSITODYSF-75013 ParisFrance

Here,we report the ability of spiropyrans to initiate two-photon polymerization(TPP)for the first time in the *** comparison and synergies between the spiropyran photochromic molecule of interest,namely 6-nitro-BIPS,and well-known photoinitiators of radical photopolymerization have been *** spiropyran(SPy)molecule can initiate TPP in the presence of trifunctional acrylic monomers and create true 3D *** comparison with Irgacure 819,a well-known Type-I photoinitiator,shows that SPy has a comparable capability for *** addition,the combination of SPy with methyl diethanolamine increased the reactivity of both one-and two-photon *** the last section,we discuss which SPy isomer is the active photochromic species capable of generating radicals for initiating two-photon polymerization.

关键词： Spiropyran direct laser writing Two-photon-photopolymerization Photochromism