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Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings

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中国物理B:英文版 2023年第10期32卷 367-376页

作者：尹志珺唐朝辉谭文肖光旭姚玉林薛栋柏顾振杰雷李华顿雄邓晓程鑫彬李同保 Institute of Precision Optical Engineering Tongji UniversityShanghai 200092China School of Physics Science and Engineering Tongji UniversityShanghai 200092China MOE Key Laboratory of Advanced Micro-Structured Materials Shanghai 200092China Shanghai Frontiers Science Center of Digital Optics Shanghai 200092China Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications Shanghai 200092China Shanghai Institute of Measurement and Testing Technology Shanghai 201203China

Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography,which greatly reduces its accuracy.In this study,we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings.We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters.Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency,and adjacent peak-to-valley heights differing by no more than 2 nm,providing an important theoretical reference for the controllable fabrication of these gratings.

关键词： self-traceable grating atom lithography positive and negative frequency detuning surface growth

The influence of divergence angle on the deposition of neutral chromium atoms using a laser standing wave

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Chinese Physics B 2012年第3期21卷 181-184页

作者：张文涛朱保华黄静熊显名蒋曲博 Guilin University of Electronic Technology Guizhou University for Nationalities

The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum （FWHM） of the stripe is 2.75 nm and the contrast is 38.5 ： 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8：1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3 ： 1 and 1.6 ： i when the divergence angles equal 0.5 and 1.0 mrad, respectively.

关键词： atom lithography laser standing wave full wave at half maximum contrast

Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field

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Chinese Physics B 2014年第2期23卷 64-69页

作者：陈晟马艳张萍萍王建波邓晓肖盛炜马蕊李同保 Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology Department of PhysicsTongji University

The use of the dipole force on atoms is a new technology that is used to build nanostructures. In this way, a high quality standard nano-grating can be obtained. Based on the semi-classical model, the motion equation is investigated and the trajectories of atoms in double half Gaussian standing wave field are simulated. Compared with the Gaussian standing wave field, the double half Gaussian standing wave can well focus the Cr atoms. In order to obtain this kind of beam, a prism is designed and the experimental result shows that the beam is well generated.

关键词： double half Gaussian beam atom lithography motion trajectory

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

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Chinese Physics B 2014年第9期23卷 143-147页

作者：邓晓李同保雷李华马艳马蕊翁浚婧李源 School of Physics Science and Engineering Tongji University Shanghai Institute of Measurement and Testing Technology National Center of Measurement and Testing for East ChinaNational Center of Testing Technology

atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is （212.8±0.1） nm with a peak-to-valley-height （PTVH） better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength （λ/2 = 212.78 nm）. The Cr nano-grating covers a 1000μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.

关键词： atom lithography nano-scale metrology standard traceability

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结合烷烃硫醇类自组装单层的亚稳原子光刻

现代科学仪器 2006年第Z1期23卷 16-17页

作者：巨新 KURAHASHI M SUZUKI T YAMAUCHI Y 南京大学中国国立材料科学研究院日本国立材料科学研究院日本

　　A number of demonstrations of nanofabrication with atom optics have been carried out by using both the direct deposition of atoms and atom lithography for vailous molecular surfaces in the past several years[1]. ……

关键词：烷烃醇类自组装单层 direct deposition atom lithography