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Study on Preparation and Ns-Laser Damage of HfO<sub>2 </sub>Single Layers

Optics and Photonics Journal 2021年第8期11卷 341-350页

作者： Kesheng Guo Lang Hu Hong Wei Qiang Hu Hongbo He Ping Xu Laboratory of Microwave and Vacuum Technology Jihua Laboratory Foshan China Laboratory of Thin Film Optics Key Laboratory of Materials for High Power Laser Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences Shanghai China

The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO2 single layers prepared by ion beam sputtering are studied. The HfO2 amorphous single layers have porous surface morphologies. Different processes will cause differences in coatings absorption and surface morphology, which in turn will cause changes in the spectral transmittance curve. The ion beam sputtering HfO2 single layers have high content of argon (4.5% - 8%). The laser damage of HfO2 single layers is related to argon inclusions and non-stoichiometric defects. The changes of argon flux and beam voltage have a greater impact on argon content and O/Hf ratio. When the argon content in the coatings is lower and the O/Hf ratio is higher, the laser damage thresholds of the HfO2 single layers are higher.

关键词： HfO2 Single Layers argon flux Laser Damage Optical Coatings

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Study on preparation and ns-laser damage of HfO2 single layers

Study on preparation and ns-laser damage of HfO2 single laye...

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第四届粤港澳大湾区真空科技创新发展论坛暨2020年广东省真空学会学术年会

作者：郭可升 Lang Hu Hong Wei Chitengfei Zhang Long Yao Qiang Hu Ping Xu Laboratory of Microwave and Vacuum Technology Jihua Laboratory

The effects of the main parameters of argon flux,oxygen flux and beam voltage on the surface morphology,transmittance spectrum and laser damage of the HfO single layers prepared by ion beam sputtering are *** HfO amorphous single layers have porous surface *** processes will cause differences in coatings absorption and surface morphology,which in turn will cause changes in the spectral transmittance *** ion beam sputtering HfO single layers have high content of argon(4.5%～8%).The laser damage of HfO single layers is related to argon inclusions and non-stoichiometric *** changes of argon flux and beam voltage have a greater impact on argon content and O/Hf *** the argon content in the coatings is lower and the O/Hf ratio is higher,the laser damage thresholds of the HfO single layers are higher.

关键词： HfO2 single layers argon flux laser damage optical coatings

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Study on Preparation and Ns-Laser Damage of HfO2 Single Layers

Study on Preparation and Ns-Laser Damage of HfO2 Single Laye...

引用

作者： Kesheng Guo Lang Hu Hong Wei Qiang Hu Hongbo He Ping Xu Laboratory of Microwave and Vacuum Technology Jihua Laboratory Laboratory of Thin Film Optics Key Laboratory of Materials for High Power LaserShanghai Institute of Optics and Fine MechanicsChinese Academy of Sciences

The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO single layers prepared by ion beam sputtering are studied. The HfO amorphous single layers have porous surface morphologies. Different processes will cause differences in coatings absorption and surface morphology, which in turn will cause changes in the spectral transmittance curve. The ion beam sputtering Hf O2 single layers have high content of argon(4.5%-8%). The laser damage of HfO single layers is related to argon inclusions and non-stoichiometric defects. The changes of argon flux and beam voltage have a greater impact on argon content and O/Hf ratio. When the argon content in the coatings is lower and the O/Hf ratio is higher, the laser damage thresholds of the HfO single layers are higher.

关键词： HfO2 Single Layers argon flux Laser Damage Optical Coatings

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