Study on Preparation and Ns-Laser Damage of HfO<sub>2 </sub>Single Layers

作     者：Kesheng Guo Lang Hu Hong Wei Qiang Hu Hongbo He Ping Xu Kesheng Guo;Lang Hu;Hong Wei;Qiang Hu;Hongbo He;Ping Xu

作者机构：Laboratory of Microwave and Vacuum Technology Jihua Laboratory Foshan China Laboratory of Thin Film Optics Key Laboratory of Materials for High Power Laser Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences Shanghai China 

出 版 物：《Optics and Photonics Journal》 (光学与光子学期刊（英文）)

年 卷 期：2021年第11卷第8期

页      面：341-350页

学科分类：08[工学] 080502[工学-材料学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：HfO₂ Single Layers Argon Flux Laser Damage Optical Coatings 

摘      要： The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO2 single layers prepared by ion beam sputtering are studied. The HfO2 amorphous single layers have porous surface morphologies. Different processes will cause differences in coatings absorption and surface morphology, which in turn will cause changes in the spectral transmittance curve. The ion beam sputtering HfO2 single layers have high content of argon (4.5% - 8%). The laser damage of HfO2 single layers is related to argon inclusions and non-stoichiometric defects. The changes of argon flux and beam voltage have a greater impact on argon content and O/Hf ratio. When the argon content in the coatings is lower and the O/Hf ratio is higher, the laser damage thresholds of the HfO2 single layers are higher.