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Recent advances in Thin film composites membranes for brackish groundwater treatment with critical focus on Saskatchewan water sources

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Journal of Environmental Sciences 2019年第7期31卷 181-194页

作者： Arash Mollahosseini Amira Abdelrasoul Department of Chemical and Biological Engineering University of Saskatchewan Global Institute of Water Security

Drinking water scarcity is an ever-increasing global concern. This issue appears as a greater threat to the countries with no access to sea water resources or rivers, since their potential water resources are only limited to ground waters only. There are serious concerns with the treatment of ground water resources, including landfill leachates, agricultural contaminations(pesticides,herbicides, and fertilizers), and rural contaminations. Membrane separation has been proved to be the governing technology in water and wastewater treatment plants, as these methods are responsible for more than half of the market share of the world's desalination capacity. This study intends to offer a holistic view of the groundwater contamination with specific focus on Saskatchewan province in Canada, and the recent efforts in the groundwater treatment using Thin film composite membrane technology. This study begins with an introduction of the general aspects of ground water and membrane separation, polluting agents, and their sources.It is followed by a discussion of Saskatchewan's groundwater status and various issues.Furthermore, the recent research that became available since 2010 is reviewed in details and the results are summarized with respect to purification efficiency. Different affecting parameters in a groundwater-Thin film composite system are synthesized and an in-depth overview is presented.

关键词： Thin film composite membrane Groundwater Brackish water Water pollution Polyamide Canada Saskatchewan

Surface modification of mesoporous silica nanoparticle with 4-triethoxysilylaniline to enhance seawater desalination properties of Thin-film nanocomposite reverse osmosis membranes

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Frontiers of Environmental Science & Engineering 2020年第1期14卷 99-108页

作者： Jian Wang Qun Wang Xueli Gao Xinxia Tian Yangyang Wei Zhen Cao Chungang Guo Huifeng Zhang Zhun Ma Yushan Zhang The Institute of Seawater Desalination and Multipurpose Utilization Ministry of Natural Resources(Tianjin)Tianjin 300192China College of Chemical and Environmental Engineering Shandong University of Science and TechnologyQingdao 266590China Key Laboratory of Marine Chemistry Theory and Technology(Ministry of Education) Ocean University of ChinaQingdao 266100China

Mesoporous silica nanoparticles(MSN),with higher water permeability than NaA zeolite,were used to fabricate Thin-film nanocomposite(TFN)reverse osmosis(RO)membranes.However,only aminoalkyl-modified MSN and low-pressure(less than 2.1 MPa)RO membrane were investigated.In this study,aminophenyl-modified MSN(AMSN)were synthesized and used to fabricate high-pressure(5.52 MPa)RO membranes.With the increasing of AMSN dosage,the crosslinking degree of the aromatic polyamide decreased,while the hydrophilicity of the membranes increased.The membrane morphology was maintained to show a ridge-and-valley structure,with only a slight increase in membrane surface roughness.At the optimum conditions(AMSN dosage of 0.25 g/L),when compared with the pure polyamide RO membrane,the water flux of the TFN RO membrane(55.67 L/m^2/h)was increased by about 21.6%,while NaCl rejection(98.97%)was slightly decreased by only 0.29%.However,the water flux of the membranes was much lower than expected.We considered that the enhancement of RO membrane permeability is attributed to the reduction of the effective thickness of the PA layer.

关键词： Thin film nanocomposite membrane Reverse osmosis Seawater desalination Aminophenyl-functionalized m esoporous silica nanoparticles

Improved carrier transport in Mn:ZnSe quantum dots sensitized La-doped nano-TiO2 Thin film

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Chinese Physics B 2020年第4期29卷 351-359页

作者：李绍李刚杨丽爽李葵英 State Key Laboratory of Metastable Materials Science and Technology College of Materials Science and EngineeringYanshan UniversityQinhuangdao 066004China

Mn:ZnSe/ZnS/L-Cys core-shell quantum dots(QDs)sensitized La-doped nano-TiO2 Thin film(QDSTF)was prepared.X-ray photoelectron spectroscopy(XPS),nanosecond transient photovoltaic(TPV),and steady state surface photovoltaic(SPV)technologies were used for probing the photoelectron behaviors in the Mn-doped QDSTF.The results revealed that the Mn-doped QDSTF had a p-type TPV characteristic.The bottom of the conduction band of the QDs as a sensitizer was just 0.86 eV above that of the La-doped nano-TiO2 Thin film,while the acceptor level of the doped Mn2+ions was located at about 0.39 eV below and near the bottom of the conduction band of the QDs.The intensity of the SPV response of the Mn-doped QDSTF at a specific wavelength was ~2.1 times higher than that of the undoped QDSTF.The region of the SPV response of the Mn-doped QDSTF was extended by 191 nm to almost the whole visible region as compared with the undoped QDSTF one.And the region of the TPV response of the Mn-doped QDSTF was also obviously wider than that of the undoped QDSTF.These PV characteristics of the Mn-doped QDSTF may be due to the prolonged lifetime and extended diffusion length of photogenerated free charge carriers injected into the sensitized La-doped nano-TiO2 Thin film.

关键词： doping effects ZnSe quantum dots sensitization nano-TiO2 Thin film photoelectron spectroscopy

Influence of Zr(50)Cu(50) Thin film metallic glass as buffer layer on the structural and optoelectrical properties of AZO films

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Chinese Physics B 2020年第3期29卷 361-368页

作者：张宝庆刘高鹏宗海涛付丽歌魏志飞杨晓炜曹国华 School of Materials Science and Engineering Henan Polytechnic UniversityJiaozuo 454000China School of Physics and Electronic Information Engineering Henan Polytechnic UniversityJiaozuo 454000China

Aluminum-doped ZnO(AZO) Thin films with Thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature on structural, optical, and electrical properties of AZO Thin film are investigated. Increasing the thickness of buffer layer and substrate temperature can both promote the transformation of AZO from amorphous to crystalline structure, while they show(100)and(002) unique preferential orientations, respectively. After inserting Zr(50)Cu(50) layer between the glass substrate and AZO film, the sheet resistance and visible transmittance decrease, but the infrared transmittance increases. With substrate temperature increasing from 25℃ to 520℃, the sheet resistance of AZO(100 nm)/Zr(50)Cu(50)(4 nm) film first increases and then decreases, and the infrared transmittance is improved. The AZO(100 nm)/Zr(50)Cu(50)(4 nm) film deposited at a substrate temperature of 360℃ exhibits a low sheet resistance of 26.7 ?/, high transmittance of 82.1% in the visible light region, 81.6% in near-infrared region, and low surface roughness of 0.85 nm, which are useful properties for their potential applications in tandem solar cell and infrared technology.

关键词： aluminum-doped ZnO(AZO) Zr(50)Cu(50) Thin film metallic glass optoelectrical properties morphology

Modulation of the electronic states of perovskite SrCrO3 Thin films through protonation via low-energy hydrogen plasma implantation approaches

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Frontiers of physics 2020年第1期15卷 43-50页

作者： Meng Wu Shanquan Chen Chuanwei Huang Xing Ye Haiping Zhou Xiaochun Huang Kelvin H.L.Zhang Wensheng Yan Lihua Zhang Kisslinger Kim Yingge Du Scott Chambers Jin-Cheng Zheng Hui-Qiong Wang Fujian Provincial Key Laboratory of Semiconductors and Applications Collaborative Innovation Center for Optoelectronic Semiconductors and Efficient DevicesDepartment of PhysicsXiamen UniversityXiamen 361005China Shenzhen Key Laboratory of Special Functional Materials College of Materials Science and EngineeringShenzhen UniversityShenzhen 518060China School of Materials and Energy University of Electronic Science and Technology of ChinaChengdu 611731China State Key Laboratory of Physical Chemistry of Solid Surfaces College of Chemistry and Chemical EngineeringXiamen UniversityXiamen 361005China National Synchrotron Radiation Laboratory University of Science and Technology of ChinaHefei 230029China Center for Functional Nanomaterials Brookhaven National LaboratoryUptonNY 11973-5000USA Physical Sciences Division Physical and Computational Sciences DirectoratePacific Northwest National LaboratoryRichlandWA 99352USA

Hydrogenation of transition metal oxides offers a powerful platform to tailor physical functionalities as well as for potential applications in modern electronic technologies.An ideal nondestructive and efficient hydrogen incorporation approach is important for the realistic technological applications.We demonstrate the proton injection on SrCro3 Thin films via an efficient low-energy hydrogen plasma implantation experiments,without destroying the original lattice framework.Hydrogen ions accumu-late largely at the interfacial regions with amorphous character which extend about one-third of the total thickness.The Hx.SrCro3(HSCO)Thin films appear like exfoliated layers which however retain the fully strained state with distorted perovskite structure.Proton doping induces the change of Cr oxidation state from Cr^4+to Cr^3+in HSCO Thin films and a transition from metallic to insulat-ing phase.Our investigations suggest an attractive platform in manipulating the electronic phases in proton-based approaches and may offer a potential peeling off strategy for nanoscale devices through low-energy hydrogen plasma implantation approaches.

关键词： transition metal oxide Thin film metal-insulator transition hydrogenation

Breaking mechanism and control technology of sandstone straight roof in Thin bedrock stope

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International Journal of Mining Science and Technology 2020年第2期30卷 259-263页

作者： Hualei Zhang Min Tu Hua Cheng Yongzhi Tang Key Laboratory of Safety and High-Efficiency Coal Mining Ministry of Education Anhui University of Science and TechnologyHuainan 232001China School of Resources and Environmental Engineering Anhui UniversityHefei 230039China Huainan Mining Group Huainan 232001China

The key problem to be solved urgently is how to avoid the occurrence of support break-off and water inrush in the stoping of sandstone straight roof under the action of load transfer in unconsolidated aquifer.For this reason,taking the Thin bedrock 1602(3)working face of Huainan(the middle part of Anhui Province)Panyi Coal Mine as the engineering background,this study establishes the stope mining model by using the discrete element UDEC software and the mathematics mechanical model of the support load,and analyzes the reason of support crushing and decides to re-mining the working face by using the compulsive roof caving method.It is concluded that when the working face of sandstone straight roof is broken,the"voussoir beam"structure cannot be formed and acts on the support in the form of cantilever beam,but only when it falls to the high key stratum can the"voussoir beam"structure be formed and at this point,at this time,the bracket bears the weight of the rock layer in the range from the fractured sandstone layer to the lower critical layer.The working resistance of the support increases with the increase of the thickness and the breaking length of straight sandstone roof.When the breaking length of the roof reaches a certain extreme value,the support crushing accidents will occur.Managing roof with compulsive roof caving method can reduce the intensity of rock pressure in the stope,and the working face can be safely stoped,which provides a certain reference for similar conditions.

关键词： Thin bedrock Key stratum Compulsive roof caving

Preparation of WO3 Thin films by dip film-drawing for photoelectrochemical performance

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Chinese Journal of Chemical Engineering 2019年第5期27卷 1207-1211页

作者： Dongbo Xu Lili Li Weiqiang Fan Fagen Wang Hongye Bai Baodong Mao Weidong Shi School of Energy and Power Engineering Jiangsu UniversityZhenjiang 212013China School of Chemistry and Chemical Engineering Jiangsu University. Zhenjiang 212013China

Here we report the WO3 Thin films on F-doped SnO2 conducting glass (FTO) substrates which were prepared by using dip film-drawing method. Dip film-drawing was a simple, convenient, economical method and in largescale to prepare photoanodes for future applications. The FTO substrates were dipped in tungstic acid solution then film-drawn included 3, 6, 9, 12 and 15 times for prepared different thicknesses of WO3 Thin film photoanodes. Then the photoa no des were employed as the electrodes in photoelectrochemical property Keywords: WO3 Thin films Dip film-drawing Photoelectrochemical Thicknesses Large-scale measurements, which include scan linear sweep, repeated on/off illumination cycles, electrochemical impedanee spectroscopy and incident phot on to current conversion efficiency, respectively. The results showed that the WO3 Thin films dipped 9 times with 175 nm thicknesses had the best photoelectrochemical performance of 0.067 mA·cm^-2 at 1.23 V versus RHE.

关键词： WO3 Thin films Dip film-drawing Photoelectrochemical Thicknesses Large-scale

Control of wall thickness and surface morphology of tungsten Thin wall parts by adjusting selective laser melting parameters

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Journal of Iron and Steel Research(International) 2019年第2期26卷 182-190页

作者： Yan-jun Xie Huai-chao Yang Xue-bing Wang Lin Zhao Chun-jiang Kuang Wei Han Central Iron and Steel Research Institule Beijing 100081China Advanced Technology&Materials Co. Ltd.Beijing 100081China

The tungsten Thin wall parts which were used as high-performance collimator devices were fabricated by optimizing selective laser melting laser parameters.The effect of laser power and scan rate on wall thickness and surface morphology of tungsten山in wall parts was investigated,respectively.The results indicated that the wall thickness increased with the enhancemem in laser power as a linear relationship.On the contrary,the wall thickness decayed exponentially with the acceleration in laser sean rate.Meanwhile,the wall thickness of the parts fabricated by laser double-pass melting was ihinner than that fabricated by laser single-pass melting.In addition,mathematic models for selecting suitable laser power and laser sean rate to fabricate specified tungsten Thin wall parts were proposed.Furthermore,the effects of laser parameters on the top surface roughness,adhesive parts and hot cracks were also discussed.

关键词： Selective laser melting Tungsten Laser power Scan rate Thin wall part Surface morphology

Inorganic UltraThin 2D Photocatalysts:Modulation Strategies and Environmental/Energy Applications

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Accounts of Materials Research 2023年第1期4卷 4-15页

作者： Mingmei Li He Zhang Zhiyong Zhao Pengfei Wang Yi Li Sihui Zhan MOE Key Laboratory of Pollution Processes and Environmental Criteria College of Environmental Science and EngineeringNankai UniversityTianjin 300350China Tianjin Key Lab Clean Energy&Pollutant Control School of Energy and Environmental EngineeringHebei University of TechnologyTianjin 300401China

CONSPECTUS:Photocatalysis technology has gained extensive attention in the past few decades due to its potential to alleviate or solve energy and environmental contamination problems.The development and design of new photocatalytic semiconductor materials with high catalytic activity has become a research hotspot in this field.In recent years,inorganic ultraThin two-dimensional(2D)semiconductor photocatalysts have shown excellent performance in photocatalytic applications due to their high specific surface area,clear atomic structure,unique electronic structure,intrinsic quantum confined electrons,and high atomic exposure ratio.When the thickness of the bulk semiconductor is decreased to the atomic level,its local atomic structure changes prominently.This is a major reason why the atomic Thin 2D materials could show improved inherent properties and produce new properties that are not available in the corresponding bulk semiconductors.Furthermore,compared with the bulk photocatalysts,the surface electronic structure of inorganic ultraThin 2D materials is more sensitive and thus could be regulated more easily by surface and interfacial modification methods,leading to great optimization of photocatalytic properties.Therefore,inorganic ultraThin 2D materials not only provide an ideal reaction model for clearly revealing the relationships between surface/interface structure characteristics and photocatalytic performance but also bring new opportunities for the development of efficient catalysts to resolve energy crises and environmental problems.In this Account,we summarize our previous work on the applications of inorganic ultraThin 2D nanomaterials in the field of photocatalysis.First,we briefly introduce the classification and controlled fabrication of inorganic ultraThin 2D nanomaterials,including metal chalcogenides,bismuth-based photocatalysts,metal oxides,and metal-free materials.Then,we focus on the surface and interfacial modification strategies for effectively engineering the photocatalytic activity of 2D ph

关键词： inorganic Thin Photo