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A NEW WELL TEST MODEL FOR stress-sensitive AND RADIALLY HETEROGENEOUS DUAL-POROSITY RESERVOIRS WITH NON-UNIFORM THICKNESSES

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Journal of Hydrodynamics 2011年第6期23卷 759-766页

作者： ZHANG Lie-hui, GUO Jing-jing, LIU Qi-guo State Key Laboratory of Reservoir Geology and Exploitation, Southwest Petroleum University, Chengdu 610500, China State Key Laboratory of Reservoir Geology and Exploitation Southwest Petroleum University Chengdu China

This article presents a new well test model for stress-sensitive composite dual-porosity reservoirs based on the concept of permeability modulus, where the rock and fluid properties as well as the formation thickness vary in the radial direction. An analytical solution in the Laplace space for the pressure-transient behavior for a line-source, constant-rate well of this type of reservoir is obtained with the Laplace transformation and the perturbation technique. The pressure and its derivative in the reservoir and the effects of relevant parameters on the pressure-transient response are obtained. The model as well as the corresponding type curves may be used in predicting the production performance or analyzing the production data for this type of reservoir.

关键词： non-uniform thickness stress-sensitive composite dual-porosity well test model type curve

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A well test model for stress-sensitive and heterogeneous reservoirs with non-uniform thicknesses

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Petroleum Science 2010年第4期7卷 524-529页

作者： Zhang Liehui Guo Jingjing Liu Qiguo State Key Laboratory of Oil and Gas Reservoir Geology and Exploitation Southwest Petroleum UniversityChengdu Sichuan 610500 China

In view of the anisotropy,heterogeneity and stress-sensitive permeability in low permeability reservoirs,an analytical well test model was established by introducing the concept of permeability *** model considered the permeability stress-sensitivity,wellbore storage effect,and the skin *** perturbation technique and Laplace transformation were used to solve the mathematical model analytically in Laplace space,and the bottom-hole pressure type curves were plotted and analyzed in real space by using the Stehfest numerical inversion.

关键词： Non-uniform thickness stress-sensitive heterogeneous reservoir transient well test type curve

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Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

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International Journal of Extreme Manufacturing 2023年第3期5卷 608-618页

作者： Yu Fan Chunhui Wang Jiaxing Sun Xiaogang Peng Hongmiao Tian Xiangming Li Xiaoliang Chen Xiaoming Chen Jinyou Shao Micro-and Nano-technology Research Center State Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi’an 710049People’s Republic of China Frontier Institute of Science and Technology(FIST) Xi'an Jiaotong UniversityXi’an710049People’s Republic of China

Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and ***,photoelectric devices’inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures ***-driven flexible-roller nanoimprint lithography for nanopatterning the optoelectronic wafer is proposed in this *** flexible nanoimprint template twining around a roller is continuously released and recovered,controlled by the roller’s simple *** electric field applied to the template and substrate provides the driving *** contact line of the template and the substrate gradually moves with the roller to enable scanning and adapting to the entire warped substrate,under the electric *** addition,the driving force generated from electric field is applied to the surface of substrate,so that the substrate is free from external ***,liquid resist completely fills in microcavities on the template by powerful electric field force,to ensure the fidelity of the *** proposed nanoimprint technology is validated on the ***,nano-grating structures are fabricated on a gallium nitride light-emitting diode chip adopting the solution,achieving polarization of the light source.

关键词： nanoimprinting electric-driven flexible-roller warped stress-sensitive

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Ile587Val Polymorphism of the eIF2B5 Gene as Susceptibility Factor for Multiple Sclerosis

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Neuroscience & Medicine 2011年第2期2卷 117-119页

作者： Carmine Ungaro Francesca L. Conforti Maria Trojano Ida Manna Virginia Andreoli Francesca Condino Paola Valentino Antonio Gambardella Aldo Quattrone Rosalucia Mazzei 不详

Mutations in the eIF2B gene cause the VWM disease. Genetic and biochemical data of MS patient and MRI data showing VWM images similar to MS lesions, encouraged the present study in which we analyzed the eIF2B5 gene in 225 unrelated MS patients to evaluate an overlapping between MS and VWM. A common variation Ile587Val was found very frequent in the MS patients respect normal controls, thus suggesting that Ile587Val should be considered as susceptibility factor in the development of MS. In conclusion, our data strongly highlight a possible involvement of the eIF2B5 in the development of MS.

关键词： Multiple Sclerosis Vanishing White Matter Disease eIF2B gene stress-sensitive neurological disorders.

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