Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer
作者机构：Micro-and Nano-technology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi’an 710049People’s Republic of China Frontier Institute of Science and Technology(FIST)Xi'an Jiaotong UniversityXi’an710049People’s Republic of China
出 版 物：《International Journal of Extreme Manufacturing》 (极端制造（英文）)
年 卷 期：2023年第5卷第3期
页 面：608-618页
核心收录：
学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0803[工学-光学工程] 0702[理学-物理学]
基 金：financed by the National Natural Science Foundation of China(Nos.52025055 and 5227050783)
主 题：nanoimprinting electric-driven flexible-roller warped stress-sensitive
摘 要：Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and ***,photoelectric devices’inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures ***-driven flexible-roller nanoimprint lithography for nanopatterning the optoelectronic wafer is proposed in this *** flexible nanoimprint template twining around a roller is continuously released and recovered,controlled by the roller’s simple *** electric field applied to the template and substrate provides the driving *** contact line of the template and the substrate gradually moves with the roller to enable scanning and adapting to the entire warped substrate,under the electric *** addition,the driving force generated from electric field is applied to the surface of substrate,so that the substrate is free from external ***,liquid resist completely fills in microcavities on the template by powerful electric field force,to ensure the fidelity of the *** proposed nanoimprint technology is validated on the ***,nano-grating structures are fabricated on a gallium nitride light-emitting diode chip adopting the solution,achieving polarization of the light source.
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