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检索条件"主题词=Plasma materials processing"
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Field Emission Properties of Nanocrystalline Carbon Films Generated in Microwave Gas Discharge plasma
Field Emission Properties of Nanocrystalline Carbon Films Ge...
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The 5th International Vacuum Electron Sources Conference(IVESC2004)
作者: S.Yu.Suzdaltsev R.K.Yafarov Institute of Radio Engineering and Electronics of RAS Saratov Department410009 Saratov P.B.1072
<正>The carbon film synthesis in a low-pressure microwave (MW) gas discharge plasma is one of promising procedures to obtain carbon electronics materials used in device operating under extreme *** is due to the fa... 详细信息
来源: cnki会议 评论
Low Dielectric Constant materials:Challenges of plasma Damage
Low Dielectric Constant Materials:Challenges of Plasma Damag...
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2006 8th International Conference on Solid-State and Integrated Circuit Technology
作者: M.R.Baklanov A.Urbanowicz G.Mannaert S.Vanhaelemeersch IMEC LeuvenBelgium
Degradation of porous low dielectric constant materials during their exposure in etch and strip plasmas is analyzed from point of view of surface chemistry and recombination of active *** the degree of damage during t... 详细信息
来源: cnki会议 评论