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Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography

Science China Chemistry 2022年第1期65卷 114-119页

作者： Di Wang Xiaofeng Yi Lei Zhang State Key Laboratory of Structural Chemistry Fujian Institute of Research on the Structure of MatterChinese Academy of SciencesFuzhou 350002China University of Chinese Academy of Sciences Beijing 100049China

nanolithography plays crucial roles in the miniaturization of dense integrated circuit,which extremely depends on innovative resist ***,metal-containing resists have been explored due to their higher short-wavelength photon absorption than traditional polymer ***,for the first time,the patterning performance of non-alkyl tin-oxo clusters has been ***,the influence of structural characteristics on resolution and sensitivity has been *** evaluate the surface ligand effect,three non-alkyl Sn_(10)-oxo clusters with the same core were functionalized with pyrazole,3-methylpyrazole and 4-methylpyrazole,***,another Sn_(14)-oxo cluster with similar core configuration was also prepared using 4-methylpyrazole ligand to study the influence of Sn ***-coating method was then applied to fabricate thin films of these non-alkyl tin-oxo clusters on Si substrate,which showed various thicknesses and *** interestingly,electron beam lithography(EBL)patterning studies indicated that for the same Sn_(10)core,the 4-methylpyrazoledecorated clusters showed the best *** for the different cluster cores with the same 4-methylpyrazole ligand,the patterns of Sn_(10)with the higher ligand:Sn ratio are also better than those of Sn_(14).Finally,distinguishable 50 nm resolution was achieved by 4-methylpyrazole-decorated Sn_(10)at expose energy of 100μC/cm2which can be significantly improved by increasing expose energy to 1,000μC/cm2as confirmed by atomic force microscopy(AFM)*** work not only opens the nanolithography applications of non-alkyl tin-oxo clusters,but also provides an effective structural methodology for improving their patterning performance in future.

关键词： non-alkyl tin-oxo clusters nanolithography ligands effect EBL patterning materials

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Self-aligned fiber-based dual-beam source for STED nanolithography

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Chinese Optics Letters 2021年第7期19卷 82-86页

作者： Jian Chen Guoliang Chen Qiwen Zhan School of Optical-Electrical and Computer Engineering University of Shanghai for Science and TechnologyShanghai 201800China

A fiber-based source that can be exploited in a stimulated emission depletion(STED) inspired nanolithography setup is *** a source maintains the excitation beam pulse, generates a ring-shaped depletion beam, and automatically realizes dual-beam coaxial alignment that is critical for two beam *** mode conversion of the depletion beam is realized by using a customized vortex fiber, which converts the Gaussian beam into a donut-shaped azimuthally polarized *** pulse width and repetition frequency of the excitation beam remain unchanged, and its polarization states can be *** to the simulated point spread function of each beam in the focal region, the full width at half-maximum of the effective spot size in STED nanofabrication could decrease to less than 28.6 nm.

关键词： nanolithography vortex fiber direct laser writing STED controlled fabrication

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Study on electrothermally actuated cantilever array for nanolithography

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Science China(Technological Sciences) 2010年第5期53卷 1184-1189页

作者： FU JianYu,CHEN DaPeng & YE TianChun Integrated Circuit Advanced Process Center,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China Integrated Circuit Advanced Process Center Institute of Microelectronics Chinese Academy of Sciences

nanolithography is a patterning technique for the fabrication of nano-scale structures.A promising method of nanolithography known as scanning probe lithography has particularly extensive applications for its high resolution,high reliability,and simple *** this paper,a novel electrothermally actuated cantilever with integrated heater,thermal conductor and actuator for scanning probe lithography is *** are designed in an 8×4 *** models are presented to simulate the temperature distribution,deflection and thermal crosstalk of the cantilever *** structure is successfully *** is demonstrated that this structure can produce a tip deflection of 16.9 μm at an actuation current of 5.5 mA and the thermal crosstalk between the cantilevers is neglected.

关键词： nanolithography scanning probe lithography electrothermal actuation

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STUDIES ON HOMOGENEOUS SCAVENGING REACTION IN CONFINED ETCHANT LAYER TECHNIQUE FOR nanolithography(I)──As(III)SCAVENGING BROMINE REACTION

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Chinese Chemical Letters 1995年第3期6卷 243-246页

作者： Lian Yong SU Jin LUO Zhong Hua LIN Zhao Wu TIAN (The State Key Laboratory for Physical Chemistry of the Solid Surface,Xiamen University,Xiamen 361005) Xiamen Univ State Key Lab Phys Chem Solid Surface Xiamen 361005 Peoples R China

It is reported that the As(III) scavenging bromine reaction rate constant can be determined by means of measuring the limiting current of a rotating disk electrode (RDE).The As(III) scavenging bromine second order reactionrate constants in sulfuric acid are 3.6×10￣5Lmol￣-1.s￣-1 at 20℃ and 8.9×10￣5Lmol￣-1s￣-1at 41℃ respectively. The activation energy is 33 *** results showsthat As (III) can be used as scavenging etchant of bromine in submicrometerand three-dimension lithography.

关键词：保保悖悖 BROMINE CONFINED ETCHANT HOMOGENEOUS LAYER nanolithography ON REACTION SCAVENG SCAVENGING STUDIES TECHNIQUE III As

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Mechanism and development of dip-pen nanolithography(DPN)

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Engineering Sciences 2008年第3期6卷 45-51,75页

作者： Jiang Hongkui Lu Shuang College of Traffic and Communications Zhejiang Normal University Jinhua Zhejiang 321004China

Dip-pen nanolithography is a new scanning probe lithography (SPL) technique based on atomic force microscopy (AFM), and now has made a great progress. The process of dip-pen lithography involves the adsorption of ink molecules on AFM tip, the formation of water meniscus, the transport of ink molecules, and diffusion of ink molecules on the substrate. More factors such as temperature, humidity, tip, scanning speed and so on will influence the process of dip-pen lithography. The paper analyzes in detail the mechanism of this technique, introduces synthetically the latest development, including electrochemical DPN, more-mode DPN, multiple DPN, multi-probe array DPN and so on. Finally, the paper describes the characteristics and the application of DPN.

关键词： dip-pen nanolithography atomic force microscopy nanofabrication

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Alkenyl-type ligands functionalized tin-lanthanide oxo nanoclusters as molecular lithography resists

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Science China Chemistry 2023年第6期66卷 1731-1736页

作者： Fang-Fang Liu Di Wang Guang-Hui Chen Yang Qiao Feng Luo Jian Zhang Lei Zhang State Key Laboratory of Structural Chemistry Fujian Institute of Research on the Structure of MatterChinese Academy of SciencesFuzhou 350002China Institute of Modern Optics College of Electronic Information and Optical EngineeringNankai UniversityTianjin 300350China School of Materials Science and Engineering&Smart Sensing Interdisciplinary Science Center Nankai UniversityTianjin 300350China College of Chemistry and Materials Science Fujian Normal UniversityFuzhouFujian 350007China

Both the cluster chemistry of tin and lanthanides have attracted extensive research interest,showing wide applications in catalysis,magnetism,luminescence,and ***,their fusion into heterometallic Sn-Ln oxo clusters is still to be *** this study,through the stabilization of alkenyl-type cis-5-norbornene-endo-2,3-dicarboxylic acid(H_(2)NE)ligands,a series of atomically precise Sn-Ln oxo nanoclusters have been successfully constructed from the assembly of heterometallic tetranuclear Sn_(x)Ln((4-x))building ***,Sn_(12)Eu_(8) and Sn_(13)Er_(6) with the highest nuclearities are built from multiple assembly of 8{Sn_(2)Eu_(2)}units and 6{Sn_(3)Er}and{Sn_(2)Er_(2)}units,***-MS analysis indicates that Sn_(13)Er_(6) has high solution stability,allowing their packing into thin films for lithography *** a result of electron beam lithography(EBL)studies,the condensation of Sn_(13)Er_(6) can be triggered by low energy radiation of 10μC/cm^(2),and 50 nm lines have been fabricated at expose energy of 50μC/cm^(2),confirming the satisfying sensitivity and resolution of Sn_(13)Er_(6).Hence,the success of this study develops the chemistry of heterometallic tin-lanthanide clusters that can be applied as novel negative photoresist materials.

关键词： cluster compounds tin lanthanides nanolithography photoresists

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SANTA： Self-aligned nanotrench ablation via Joule heating for probing sub-20 nm devices

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Nano Research 2016年第10期9卷 2950-2959页

作者： Feng Xiong Sanchit Deshmukh Sungduk Hong Yuan Dai Ashkan Behnam Feifei Lian Eric Pop Department of Electrical Engineering Stanford University Stanford CA 94305 USA Department of Electrical and Computer Engineering University of Illinois at Urbana-Champaign Urbana IL 6180 I USA

Manipulating materials at the nanometer scale is challenging, particularly if alignment with nanoscale electrodes is desired. Here, we describe a lithography-free, self-aligned nanotrench ablation （SANTA） technique to create nanoscale ＂trenches＂ in a polymer like poly（methyl methacrylate）（PMMA）. The nanotrenches are self-aligned with carbon nanotube （CNT） or graphene ribbon electrodes through a simple Joule heating process. Using simulations and experiments we investigated how the Joule power, ambient temperature, PMMA thickness, and substrate properties affect the spatial resolution of this technique. We achieved sub-20 nm nanotrenches, for the first time, by lowering the ambient temperature and reducing the PMMA thickness. We also demonstrated a functioning nanoscale resistive memory （RRAM） bit self- aligned with a CNT control device, achieved through the SANTA approach. This technique provides an elegant and inexpensive method to probe nanoscale devices using self-aligned electrodes, without the use of conventional alignment or lithography steps.

关键词： nanolithography carbon nanotubes graphene finite element self-aligned fabrication nanoscale thermal transport

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A functional probe with bowtie aperture and bull's eye structure for nanolithograph

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Chinese Physics B 2012年第10期21卷 423-427页

作者：王硕李旭峰王乔郭英楠潘石 School of Physics and Optoelectronic Technology Dalian University of Technology School of Applied Science Taiyuan University of Science and Technology

The bowtie aperture surrounded by concentric gratings(the bull’s eye structure) integrated on the near-field scanning optical microscopy(NSOM) probe(aluminum coated fiber tip) for nanolithography has been investigated using the finite-difference time domain(FDTD) *** modifying the parameters of the bowtie aperture and the concentric gratings,a maximal field enhancement factor of 391.69 has been achieved,which is 18 times larger than that obtained from the single bowtie ***,the light spot depends on the gap size of the bowtie aperture and can be confined to *** superiority of the combination of the bowtie aperture and the bull’s eye structure is confirmed,and the mechanism for the electric field enhancement in this derived structure is analyzed.

关键词： surface plasmon polariton nanolithography finite difference time domain method

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A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology

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Chinese Journal of Chemistry 2014年第5期32卷 399-404页

作者： Xin Chen Lihui Zhou Ping Wang Hongliang Cao Xiaoli Miao Feifei Wei Key Laboratory for Ultrafine Materials of Ministry of Education and Shanghai Key Laboratory of Advanced Polymeric MaterialsSchool of Materials Science and EngineeringEast China University of Science and TechnologyShanghai 200237China Department of Materials Science and Engineering University of Illinois at Urbana-ChampaignUrbanaIL 61801USA State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Microsystem and Information TechnologyChinese Academy of SciencesShanghai 200050China East China University of Science and Technology Shanghai 200237China State Key Laboratory of Bioreactor Engineering Biomedical Nanotechnology CenterEast China University of Science and TechnologyShanghai 200237China

SiCx nano dots and nano wires with sizes from 60 nm to approximately 2μm were fabricated using liquid cell transmission electron microscope(TEM)technology.A SiCl_(4)in CH_(2)Cl_(2)solution was sealed between two pieces of Si_(3)N_(4)window grids in an in situ TEM liquid *** 200 keV electron beams were used to bombard the sealed precursors,which caused decomposition of the precursor materials,and deposition of the nano materials on the Si_(3)N_(4)window *** size of nano dots increased with beam exposure time,following an approximately exponential relationship with the beam *** electrons are attributed as the primary sources for the Si and C reduction.A nano device was formed from a deposited nano wire,with its electrical property characterized.

关键词： electron beam induced deposition in situ TEM nanolithography nanodevices

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Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

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Chinese Physics Letters 2014年第8期31卷 160-162页

作者：王智浩刘文左强王磊赵彦立徐智谋 WuhanNationalLaboratoryforOptoelectronics SchoolofOpticalandElectronicinformationHuazhongUniversityofScienceandTechnologyWuhan430074 StateKeyLaboratoryofOpticalCommunicationTechnologiesandNetworks WuhanResearchInstituteofPostsandTelecommunicationsWuhan430074

The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nanoimprint process by a multi-layer mask method is introduced to enhance the depth of the final lift-of[pattern. Pillar photonic crystal is fabricated from the hole pattern defined by NIL to prove the pattern-reversal capability. On its basis, combining the features of overetehing technology and the lateral diffusion phenomenon in the metal depositing process, pillar-shaped photonic crystal stamps with different duty cycles have been fabricated by adjusting the etching time of the lift-off layer. Based on this process, a 50-nm line width metal grating is fabricated from a soft stamp with an aspect ratio as low as 1.

关键词： NANOIMPRINT lithography RESEARCH nanolithography PHOTONIC crystals ULTRAVIOLET lithography METAL fabrication

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