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Effects of sputtering power and annealing temperature on surface roughness of gold films for high-reflectivity synchrotron radiation mirrors

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Nuclear Science and Techniques 2019年第7期30卷 36-41页

作者： Jia-Qi Chen Qiu-Shi Huang Run-Ze Qi Yu-Fei Feng Jiang-Tao Feng Zhong zhang Wen-Bin Li zhan-shan wang MOE Key Laboratory of Advanced Micro-Structured Materials Institute of Precision Optical Engineering (IPOE)School of Physics Science and Engineering Tongji University

Gold films deposited by direct current magnetron sputtering are used for synchrotron radiation optics. In this study, the microstructure and surface roughness of gold films were investigated for the purpose of developing high-reflectivity mirrors. The deposition process was first optimized. Films were fabricated at different sputtering powers (15, 40, 80, and 120 W) and characterized using grazing incidence X-ray reflectometry, X-ray diffraction, and atomic force microscopy. The results showed that all the films were highly textured, having a dominant Au (111) orientation, and the film deposited at 80 W had the lowest surface roughness. Subsequently, post-deposition annealing from 100 to 200℃ in a vacuum was performed on the films deposited at 80 W to investigate the effect of annealing on the microstructure and surface roughness of the films. The grain size, surface roughness, and their relationship were investigated as a function of annealing temperature. AFM and XRD results revealed that at annealing temperatures of 175 ℃ and below, microstructural change of the films was mainly manifested by the elimination of voids. At annealing temperatures higher than 175℃, grain coalescence occurred in addition to the void elimination, causing the surface roughness to increase.

关键词： Gold films Sputtering power Annealing Microstructure Roughness

Investigation of nanometer-scale films using low angle Xray reflectivity analysis in IPOE

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Optoelectronics Letters 2007年第2期3卷 88-90页

作者： wang zhan-shan XU Yao wang Hong-chang ZHU Jing-tao zhanG Zhong wang Feng-li CHEN Ling-yan Institute of Precision Optical Engineering Tongji University Shanghai 200092 China

The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.

关键词： IPOE 纳米级薄膜 X线反射率分析多层结构参数

Stress, Roughness and Reflectivity Properties of Sputter-Deposited B4C Coatings for X-Ray Mirrors

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Chinese Physics Letters 2019年第12期36卷 17-21页

作者： Jia-Li Wu Run-Ze Qi Qiu-Shi Huang Yu-Fei Feng zhan-shan wang Zi-Hua Xin Department of Physics Shanghai UniversityShanghai 200444 MOE Key Laboratory of Advanced Micro-Structured Materials Shanghai 200092 Institute of Precision Optical Engineering School of Physics Science and EngineeringTongji UniversityShanghai 200092

Boron carbide(B4C)coatings have high reflectivity and are widely used as mirrors for free-electron lasers in the x-ray ***,B4C coatings fabricated by direct-current magnetron sputtering show a strong compressive stress of about-3 *** changing the argon gas pressure and nitrogen-argon gas mixing ratio,we are able to reduce the intrinsic stress to less than-1 GPa for a 50-nm-thick B4C *** is found that the stress in a coating deposited at 10 m Torr is-0.69 GPa,the rms roughness of the coating surface is 0.53 nm,and the coating reflectivity is 88%,which is lower than those of coatings produced at lower working *** the working gas contains 8%nitrogen and 92%argon,the B4 C coating shows not only-1.19 GPa stress but also a low rms roughness of 0.16 nm,and the measured reflectivity is 93%at the wavelength of 0.154 nm.

关键词： coating stress carbide

Research of multilayers in EUV, soft X-ray and X-ray

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光学精密工程 2005年第4期13卷 512-518页

作者： wang zhan-shan wang Feng-li zhanG Zhong wang Hong-chang WU Wen-juan zhanG Shu-min XU Yao GU Zhong-xiang CHENG Xin-bin L1 Cun-xia WU Yong-rong wang Bei QIN Shu-jin CHEN Ling-yan Institute of Precision Optical Engineering Department of Physics Tongji University Shanghai 200092 China

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm, Mo/Si multilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10% and 25%. The broadband analyzers have been designed, fabricated and characterized for 13～20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0.154 nm have been designed, fabricated and characterized.

关键词： EUV X射线多层性激光宽带光纤

Calibration of X-ray telescope prototypes at PANTER

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Research in Astronomy and Astrophysics 2019年第12期19卷 199-206页

作者： Ying-Yu Liao Zheng-Xiang Shen Jun Yu Qiu-Shi Huang Bin Ma Zhong zhang Xiao-Qiang wang Kun wang Chun Xie Vadim Burwitz Gisela Hartner Marlis-Madeleine La Caria Carlo Pelliciari zhan-shan wang Key Laboratory of Advanced Micro-Structured Materials Ministry of EducationTongji UniversityShanghai 200092China Institute of Precision Optical Engineering School of Physics Science and EngineeringTongji UniversityShanghai 200092China School of Mechanical Engineering Tongji UniversityShanghai 200092China Sino-German College of Applied Sciences Tongji UniversityShanghai 200092China Max-Planck-Institute for Extraterrestrial Physics Giessenbachstr85748 GarchingGermany

We report on a ground X-ray calibration of two X-ray telescope prototypes at the PANTER X-ray Test Facility, operated by the Max-Planck-Institute for Extraterrestrial Physics, in Neuried, *** X-ray telescope prototypes were developed by the Institute of Precision Optical Engineering(IPOE)of Tongji University, in a conical Wolter-I configuration, using thermal glass slumping *** #1 with three layers and Prototype #2 with 21 layers were tested to assess the prototypes’ onaxis imaging performance. The measurement of Prototype #1 indicates a Half Power Diameter(HPD) of 82′′ at 1.49 keV. As for Prototype #2, we performed more comprehensive measurements of on-axis angular resolution and effective area at several energies ranging from 0.5–10 keV. The HPD and effective area are111′′ and 39 cm^2 at 1.49 keV, respectively, at which energy the on-axis performance of the prototypes is our greatest concern.

关键词： X-ray telescopes thermal slumping technology X-ray calibration PANTER

The development of laser-produced plasma EUV light source

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Chip 2022年第3期1卷 50-60页

作者： De-Kun Yang Du wang Qiu-Shi Huang Yi Song Jian Wu Wen-Xue Li zhan-shan wang Xia-Hui Tang Hong-Xing Xu Sheng Liu Cheng-Qun Gui The Institute of Technological Sciences Wuhan UniversityWuhan 430072China Key Laboratory of Advanced Micro-Structured Materials MOE Institute of Precision Optical EngineeringSchool of Physics Science and EngineeringTongji UniversityShanghai 200092China State Key Laboratory of Precision Spectroscopy East China Normal UniversityShanghai 200241China School of Optical and Electronic Information Huazhong University of Science and TechnologyWuhan 430074China School of Physics and Technology Wuhan UniversityWuhan 430072China

Extreme ultraviolet lithography(EUVL)has been demonstrated to meet the industrial requirements of new-generation semiconductor *** development of high-power EUV sources is a long-term critical challenge to the implementation of EUVL in high-volume manufacturing(HVM),together with other technologies such as photoresist and ***,both theoretical studies and experiments have clearly indicated that the CO 2 laser-produced plasma(LPP)system is a promising solution for EUVL source,able to realize high conversion efficiency(CE)and output ***,ASML’s NXE:3400B EUV scanner configuring CO_(2) LPP source sys-tem has been installed and operated at chipmaker ***-while,other research teams have made different progresses in the development of LPP EUV ***,in their technologies,some critical areas need to be further improved to meet the requirements of 5 nm node and *** needed improvements include higher laser power,stable droplet generation system and longer collector *** this paper,we describe the performance characteristics of the laser system,droplet generator and mirror collector for different EUV sources,and also the new development results.

关键词： Extreme ultraviolet source Laser-produced plasma Sn target Long lifetime collector

Spectral properties of Pr:CNGG crystals grown by micro-pulling-down method

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Chinese Physics B 2019年第8期28卷 345-348页

作者： Yan-Yan Xue Na Li Dong-Hua Hu Qing-Song Song Xiao-Dong Xu Dong-Hai wang Qing-Guo wang Dong-Zhen Li zhan-shan wang Jun Xu School of Physics Science and Engineering Institute for Advanced StudyTongji UniversityShanghai 200092China Jiangsu Key Laboratory of Advanced Laser Materials and Devices School of Physics and Electronic EngineeringJiangsu Normal UniversityXuzhou 221116China

Pr^3+-doped calcium niobium gallium garnet(Pr:CNGG)single crystals with different Pr^3+concentrations are successfully grown by the micro-pulling-down(μ-PD)*** crystal structure,room-temperature absorption spectra,and fluorescence spectra of Pr:CNGG crystals are measured and *** fluorescence results indicate their large dependence on the doping *** fluorescence lifetime of the 1D2 energy level is also *** results indicate that Pr:CNGG crystal could be a potential solid-state laser gain medium.

关键词： Pr:CNGG μ-PD method spectral properties

Investigation of natural contamination layer growth on optical substrates

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Chinese Physics C 2018年第11期42卷 107-119页

作者： Li Jiang Qiu-Shi Huang Igor V.Kozhevnikov Yi-Yun Yao Jiang-Tao Feng Yu-Fei Feng Bin Ma Hong-Fei Jiao Hong Chen Zhong zhang zhan-shan wang Key Laboratory of Advanced Micro-Structured Materials MOE Institute of Precision Optical Engineering School of Physics Science and Engineering Tongji University Shanghai 200092 China Shubnikov Institute of Crystallography of Federal Scientific Research Centre "Crystallography and Photonics" of the Russian Academy of Sciences Leninskiy pr. 59 Moscow 119333 Russia

The surface contamination layer on mirrors can cause significant degradation of the optical performance, which is widely observed in applications, particularly in the fabrication of X-ray focusing telescopes. In this paper, we study the natural contamination layer arising from adsorption precipitation of hydrocarbons or other organic and water molecules in the absence of any external factor. Temporal evolution of the layer formed on super-smooth fused silica, borosilicate glass, and silicon substrates is studied by X-ray reflectometry, atomic force microscopy, and transmission electron microscopy for a one-year period after surface cleaning. The general characteristics of adhesion layer growth are established and discussed. The reconstructed dielectric constant profiles demonstrate that an increase in the adhesion layer thickness, deposited mass and density over time obeys power laws with extremely small exponents. Therefore, the adhesion layer growth is rapid immediately after surface cleaning, with a - 1 nm thick layer formed within the first day on all three substrates studied, while the layer density is low （- 1 g/cm^3）. The layer growth on the fused silica and silicon substrates became very slow in the succeeding days, with only a 1.4-1.5 nm thick layer and 1.2-1.3 g/cm^3 density after one year of storage in air. At the same time, the adhesion layer growth on the glass substrate showed unexpected acceleration about two months after cleaning, so that the layer thickness reached - 2.2 nm after one year of storage. The reason for this effect, which is connected with leaching of the glass, is discussed briefly.

关键词： X-ray telescope surface contamination surface dynamics X-ray reflectometry inverse problem

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下分层不同层位千米钻孔稳定性研究

应用数学和力学 2017年第9期38卷 1041-1052页

作者：石占山梁冰王岩秦冰辽宁工程技术大学矿业学院辽宁阜新123000 辽宁工程技术大学力学与工程学院辽宁阜新123000 煤科集团沈阳研究院有限公司辽宁抚顺113122

抽采钻孔的稳定性影响到抽采工程效果的好坏.采动作用下,位于底板下方不同层位千米钻孔的加卸载路径不同.为得到采动作用对不同层位钻孔稳定性的影响,分析了底板不同层位钻孔加卸载路径.依据该路径,设计十种数值模拟计算方案,对底板钻... 详细信息

抽采钻孔的稳定性影响到抽采工程效果的好坏.采动作用下,位于底板下方不同层位千米钻孔的加卸载路径不同.为得到采动作用对不同层位钻孔稳定性的影响,分析了底板不同层位钻孔加卸载路径.依据该路径,设计十种数值模拟计算方案,对底板钻孔在不同速率加卸载、变速加卸载两种方式下的破坏范围、孔壁位移进行了分析,得到了加卸载结束后各方案对应的塑性区分布范围及加卸载过程中孔壁位移曲线.依据数值计算得到的卸载速率与形变恢复滞后性的关系,建立了考虑卸载速率变化的钻孔周边切应力计算模型.研究结果表明:加载速率对钻孔周边的破坏范围几乎不产生影响;卸载过程中,钻孔周边破坏范围与初始卸载应力及卸载速率相关,在进行底板顺层抽采钻孔布置时需综合考虑布孔位置处的应力值及卸载速率.

关键词：特厚煤层水平分层开采千米钻孔稳定性采动底板