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Two-Photon Direct Laser Writing Beyond the Diffraction Limit Using the Nanopositioning and Nanomeasuring Machine

Nanomanufacturing and Metrology 2021年第3期4卷 149-155页

作者： Laura Mohr-Weidenfeller Annika-Verena Hacker Carsten Reinhardt eberhard manske Microsystems Technology Group Ilmenau University of TechnologyMax-Planck-Ring 12IlmenauGermany Institute for Process Measurement and Sensor Technology Ilmenau University of TechnologyGustav-Kirchhoff-Str.1IlmenauGermany Bremen University of Applied Science Neustadtswall 30BremenGermany

Since the first realization of two-photon direct laser writing(DLW)in Maruo et al.(Opt Lett 22:132-134,1997),the manufacturing using direct laser writing techniques spread out in many laboratories all over the *** materials with different material properties open a new field for micro-and *** achievable structuring resolution using this technique is reported to be sub-100 nm(Paz et *** *** Appl.24:042004,2012),while a smallest linewidth of 25 nm could be shown in Tan et al.(Appl Phys Lett 90:071106,2007).In our approach,the combination of DLW with the nanopositioning and nanomeasuring machine NMM-1 offers an improvement of the technique from the engineering side regarding the ultra-precise positioning(Weidenfeller et *** Adv Fabr Technol Micro/Nano Opt Photon Ⅺ 10544:105440E,2018).One big benefit besides the high positioning resolution of 0.1 nm is offered by the positioning range of 25 mm×25 mm×5 mm(Jager et *** Technisches Messen 67:319-323,2000;manske et *** Meas Sci Technol 18:520-527,2007).Thus,a trans-scale fabrication without any stitching or combination of different positioning systems is *** immense synergy between the highly precise positioning and the DLW is demonstrated by the realization of resist lines and trenches whose center-to-center distance undergoes the modified diffraction limit for two-photon *** precise positioning accuracy enables a defined distance between illuminated ***,with a comparable huge width of the trenches of 1.655|im due to a low effective numerical aperture of 0.16,a resist line of 30 nm between two written trenches could be *** the interrelationships for achieving such narrow trenches have not yet been clarified,much smaller resist lines and trench widths are possible with this approach in the near future.

关键词： Direct laser writing Nanopositioning and nanomeasuring machine Two-photon absorption Laser power controlling

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Heterodyne Standing-Wave Interferometer with Improved Phase Stability

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Nanomanufacturing and Metrology 2021年第3期4卷 190-199页

作者： Ingo Ortlepp Jens-Peter Zollner Ivo W.Rangelow eberhard manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstraBe 2998693 IlmenauGermany Microelectronic and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group Technische Universitat IlmenauIlmenauGermany

This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each *** resulting standing wave has an intensity profile which is moving with a constant velocity,and is directly detected inside the laser beam by two thin and transparent photo *** first sensor is at a fixed position,serving as a phase reference for the second one which is moved along the optical axis,resulting in a frequency shift,proportional to the *** phase difference between both sensors is evaluated for the purpose of interferometric length measurements.

关键词： Standing wave Interferometer Heterodyne Ultrathin photo diode

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Fundamental Investigations in the Design of Five-Axis Nanopositioning Machines for Measurement and Fabrication Purposes

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Nanomanufacturing and Metrology 2021年第3期4卷 156-164页

作者： Ralf Schienbein Florian Fern Rene Theska Shraddha Supreeti Roland FuBl eberhard manske Department of Mechanical Engineering Institute of Design and Precision Engineering.Technical University of Ilmenau.IlmenauGermany Institute of Process Measurement and Sensor Technology Department of Mechanical EngineeringTechnical University of IlmenauIlmenauGermany Electronics Technology Group Department of Electrical Engineering and Information TechnologyTechnical University of IlmenauIlmenauGermany

The majority of nanopositioning and nanomeasuring machines(NPMMs)are based on three independent linear movements in a Cartesian coordinate *** in combination with the specific nature of sensors and tools limits the addressable part *** enhancement of an NPMM is introduced by the implementation of rotational movements while keeping the precision in the nanometer *** this purpose,a parameter-based dynamic evaluation system with quantifiable technological parameters has been set up and employed to identify and assess general solution concepts and adequate *** taken show high potential for three linear movements of the object in combination with two angular movements of the *** influence of the additional rotation systems on the existing structure of NPMMs has been investigated further *** series on the repeatability of an NPMM enhanced by a chosen combination of a rotary stage and a goniometer setup are *** a result of these test series,the necessity of in situ position determination of the tool became very *** tool position is measured in situ in relation to a hemispherical reference mirror by three Fabry-Perot *** optimization has been used to enhance the overall system structure with regard to reproducibility and long-term *** have been experimentally investigated by use of a retroreflector as a tool and the various laser interferometers of the *** knowledge gained has been formed into general rules for the verification and optimization of design solutions for multiaxial nanopositioning machines.

关键词： Multiaxial nanopositioning and nanomanufacturing Ultra-precision machine designs 5-Axis operation Ultraprecision rotations

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A Heterodyne Interferometer with Separated Beam Paths for High-Precision Displacement and Angular Measurements

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Nanomanufacturing and Metrology 2021年第3期4卷 200-207页

作者： Guido Straube Juan Sebastian Fischer Calderon Ingo Ortlepp Roland FuBl eberhard manske Technische Universitat Ilmenau EhrenbergstraBe 2998693 IlmenauGermany

As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes,inverse concepts are a promising approach for addressing this *** inverse principle entails other limitations,as for high-precision positioning of a sensor head within a large measurement volume,three four-beam interferometers are required in order to measure all necessary translations and rotations of the sensor head and reconstruct the topography of the reference system consisting of fixed mirrors in the x-,y-,and *** present the principle of a passive heterodyne laser interferometer with consequently separated beam paths for the individual heterodyne *** beam path design is illustrated and described,as well as the design of the signal-processing and evaluation algorithm,which is implemented using a System-On-a-Chip with an integrated FPGA,CPU,and A/D converters.A streamlined bench-top optical assembly was set up and measurements were carried out to investigate the remaining ***,reference measurements with a commercial homodyne interferometer were executed.

关键词： Heterodyne laser interferometer He-Ne laser Optical fiber coupling Beat frequency Non-linearities

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Foreword to the Special Issue on "Tip-and Laser-Based 3D Nanofabrication in Extended Macroscopic Working Areas"

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Nanomanufacturing and Metrology 2021年第3期4卷 131-131页

作者： eberhard manske Rene Theska Thomas Frohlich Ingo Ortlepp Technische Universitat Ilmenau IlmenauGermany

The semiconductor industry has been following Moore’s law with astonishing continuation for 55 years *** is advancing from precision manufacturing,micromanufacturing,and nanomanufacturing toward atomic and close-to-a... 详细信息

关键词： continuation law manufacturing

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纳米定位测量机操作测量结果(英文)

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纳米技术与精密工程 2004年第2期2卷 81-84页

作者： JAGER Gerd GRUNWALD Rainer manske eberhard HAUSOTTE Tino FUβL Roland 德国伊尔梅瑙工业大学

伊尔梅瑙工业大学过程测量和传感技术研究所研制了三维纳米定位和测量机 (NPMM ) .阿贝无偏设计使得该机器异常精确 .在整个 2 5mm× 2 5mm× 5mm的定位和测量域内 ,干涉测长系统分辨力可达 0 .1nm ,不确定度达 5～ 10nm .提供了纳米定... 详细信息

伊尔梅瑙工业大学过程测量和传感技术研究所研制了三维纳米定位和测量机 (NPMM ) .阿贝无偏设计使得该机器异常精确 .在整个 2 5mm× 2 5mm× 5mm的定位和测量域内 ,干涉测长系统分辨力可达 0 .1nm ,不确定度达 5～ 10nm .提供了纳米定位测量机的基本信息 ,介绍其操作模式。

关键词：纳米定位纳米测量激光干涉仪控制系统长距扫描探针技术

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Tip-and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas

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Nanomanufacturing and Metrology 2021年第3期4卷 132-148页

作者： Ingo Ortlepp Thomas Frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg eberhard manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstrasse 2998693 IlmenauGermany Control Engineering Group Technische Universitat IlmenauIlmenauGermany Optical Engineering Group.Technische Universitat Ilmenau IlmenauGermany Microsystems Technology Group.Technische Universitat Ilmenau IlmenauGermany Precision Engineering Group.Technische Universitat Ilmenau IlmenauGermany Compliant Systems Group Technische Universitat IlmenauIlmenauGermany Micro-and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group.Technische Universitat Ilmenau IlmenauGermany Division for Research Service and Technology Transfer Technische Universitat IlmenauIlmenauGermany Electronics Technology Group.Technische Universitat Ilmenau IlmenauGermany IMMS Institut flir Mikroelektronik-und Mechatronik-Systeme Gemeinniitzige GmbH(IMMS GmbH) IlmenauGermany Fachgebiet Technische Physik City University of Applied SciencesBremenGermany Lehrstuhl fiir Fertigungsmesstechnik Friedrich-Alexander-U niversitat(FAU)Erlangen-NiirnbergGermany JUMO GmbH&Co.KG FuldaGermany Asphericon GmbH JenaGermany

The field of optical lithography is subject to intense research and has gained enormous ***,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional *** effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning *** society for optics and ***,Bellingham,***://***/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication ***,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square *** scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional *** challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life *** platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)*** this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimete

关键词： Nanomeasuring Nanopositioning Nanomanufacturing Scale-spanning Tip-based Laser-based Nanofabrication

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Modelling of particle layer detachment—Role of transient kinetic effects

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Particuology 2009年第1期7卷 45-51页

作者： eberhard Schmidt Faculty D-Safety Engineering/Environmental Protection University of WuppertalBuilding FFRainer-Gruenter-StrasseD-42119 WuppertalGermany

Particle layers tend to build up on wails in many filtration and separation processes, calling for periodic removal in order to keep the apparatus running. Important factors are the adhesion of the layer on the substrate and the cohesion of the particles in the layer. Models describing such layer detachment generally assume constant and homogeneous conditions for the forces acting on the layer. But in reality detachment is extremely non-stationary concerning place and time, primarily due to changing conditions of the detaching forces on the one hand and changes in the particle layer morphology on the other. This paper describes a model and a simulation based on this model considering such transient kinetic effects, for which some computing results are presented and discussed.

关键词： Adhesive forces Filter cleanability Dust cake discharge Patchy cleaning

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Nucleon excitations

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Chinese Physics C 2010年第9期34卷 1241-1246页

作者： eberhard Klempt Helmholtz-Institut für Strahlen- und Kernphysik der Universitt Bonn Nuβallee 14-16

The mass pattern of nucleon and Δ resonances is compared with predictions based on quark models,the Skyrme model,AdS/QCD,and the conjecture of chiral symmetry restoration.

关键词： baryon resonances AdS/QCD quark models chiral symmetry

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Quantification of particle separation using electrostatically charged spray mist in a dust chamber

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Particuology 2021年第5期19卷 92-98页

作者： Marcel Zillgitt eberhard Schmidt Institute of Particle Technology Rainer Gruenter StraBeBuilding FFCampusFreudenbergBergische Universitat Wuppertal42119 WuppertalGermany

In order to improve the efficiency of reducing fine dust emissions from diffuse sources,the commonly used water mist can be electrostatically ***,the attraction between particles and droplets increases due to electrostatic field *** the experimental investigations carried out,an electrostatic two-fluid nozzle was used to generate a charged spray mist according to the principle of charging by *** a chamber,dispersed dust was precipitated with the spray mist,while detecting the laser light *** means of comparative measurements it could be shown that faster sedimentation and separation takes place through electrostatic *** variations regarding the use of compressed air and water were investigated and the sedimentation time of the particle-droplet mixture in the chamber was shown.A size distribution was then calculated from the laser light attenuation,which shows that the proportion of small particles decreases with spray ***,the influence of the polarity of droplets and solid particles on the reduction measure was determined.

关键词： Dust separation Spray mist Electrostatic Dust chamber Laser light attenuation Charging by induction

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