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Effect of Epoxy Resin on the Thermal, Mechanical and Rheological Properties of Polybutylene Terephthalate/Glycidyl Methacrylate Functionalized Methyl Methacrylate-butadiene Blend

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Chemical Research in Chinese Universities 2016年第1期32卷 140-148页

作者： HAO Yanping BIAN Junjia YANG Huili ZHANG Huiliang GAO Ge dong lisong College of Chemistry Jilin University Changchun 130012 P.. R. China Key Laboratory of Polymer Eeomaterials Changchun Institute of Applied Chemistry Chinese Academy of Sciences Changehun 130022 P. R. China

Epoxy resin was used to modify polybutylene lized methyl methacrylate-butadiene（MB-g-GMA） blend. terephthalate（PBT） and glycidyl methacrylate functiona- Results show that MB-g-GMA dispersed in PBT matrix uniformly and PBT/MB-g-GMA/epoxy blends reveal good compatibility. However, the added epoxy resin restricted the mobility of PBT macromolecular chains during the growth process of the crystal, which reduced the final crystallinity of PBT. The PBT/MB-g-GMA blend containing 1%（mass fraction） epoxy resin exhibited good mechanical properties. For example, the notched impact strength of the PBT/MB-g-GMA blend with 1%（mass fraction） epoxy resin was about 2 times that of PBT/MB-g-GMA blend. Sanning electron microscope（SEM） results show that the shear yielding of the PBT matrix and the cavitations of rubber particles were the major toughening mechanisms. The chemical reaction between PBT and epoxy resin induced the high complex viscosity and storage modulus of PBT/MB-g-GMA blend.

关键词： Blend Epoxy resin Thermal property Mechanical property Rheological property Toughening mechanism

TEM characterization of the TiN coatings fabricated by reactive plasma spraying

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Chinese Science Bulletin 2008年第11期53卷 1753-1756页

作者： ZOU dongLi YAN DianRan HE JiNing XIAO lisong dong YanChun School of Materials Science and Engineering Hebei University of Technology Tianjin 300132 China

The nanostructured TiN coatings were fabricated by the reactive plasma spraying, and the micro-structure of the coatings was analyzed by XRD, SEM and TEM. The results show that the coatings are composed of TiN and Ti3O phases, and the coatings have the typical sprayed lamellae structures. The nanoscale grains with particle diameters less than 100 nm are observed in the coatings by TEM, and both fine equiaxed and columnar grains are found simultaneously in the nanostructured TiN coatings. Furthermore, the deformation twins are verified by TEM in the coatings, which are caused by the high cooling rate and the non-uniform temperature distribution in the plasma jet.

关键词：氮化钛涂层等离子喷涂纳米结构透射电子显微镜微观结构

Titanium carbonitride thick coating prepared by plasma spray synthesis and its tribological properties

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Chinese Science Bulletin 2007年第13期52卷 1849-1855页

作者： ZHU Lin HE JiNing YAN DianRan XIAO lisong dong YanChun XUE DingChuan MENG DeLiang School of Materials Science and Engineering Hebei University of Technology Tianjin 300132 China

TiCN coating, owing to its superior wear-resistance, has been frequently applied in many fields. TiCN thick coating was first prepared by reactive plasma spraying. The phase composition, microstructure and tribological properties of the TiCN coating were investigated in this research. Experimental results show that the microstructure of the TiCN coating was quite dense, and there was also a little amount of titanium oxides within the coating. By XPS analysis, Ti-C and Ti-N bonds were detected in the coating. The TiCN coating exhibited superior wear-resistance. The failure mechanism was attributed to the ad-hesive wear, the grinding of TiCN hard-grain, as well as the coating failure by oxidation. There were more Fe, Cr, O, etc. in the failure zone, suggesting that the corrosion propagated gradually from sur-face to interior.

关键词：碳氮化钛包覆等离子体磨损程度

Fast source mask co-optimization method for high-NA EUV lithography

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Opto-Electronic Advances 2024年第4期7卷 44-54页

作者： Ziqi Li lisong dong Xu Ma Yayi Wei EDA Center Institute of Microelectronics of Chinese Academy of SciencesBeijing 100029China Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and PhotonicsBeijing Institute of TechnologyBeijing 100081China University of Chinese Academy of Sciences Beijing 100049China Guangdong Greater Bay Area Applied Research Institute of Integrated Circuit and Systems Guangzhou 510700China

Extreme ultraviolet(EUV)lithography with high numerical aperture(NA)is a future technology to manufacture the integrated circuit in sub-nanometer ***,source mask co-optimization(SMO)is an extensively used approach for advanced lithography process beyond 28 nm technology *** work proposes a novel SMO method to improve the image fidelity of high-NA EUV lithography system.A fast high-NA EUV lithography imaging model is established first,which includes the effects of mask three-dimensional structure and anamorphic ***,this paper develops an efficient SMO method that combines the gradient-based mask optimization algorithm and the compressivesensing-based source optimization algorithm.A mask rule check(MRC)process is further proposed to simplify the optimized mask *** illustrate that the proposed SMO method can significantly reduce the lithography patterning error,and maintain high computational efficiency.

关键词： computational lithography high-NA EUV lithography source-mask co-optimization lithography imaging model

Selection of DBO measurement wavelength for bottom mark asymmetry based on FDTD method

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Journal of Semiconductors 2019年第12期40卷 101-106页

作者： Buqing Xu Qiang Wu lisong dong Yayi Wei University of Chinese Academy of Sciences Beijing 100049China Shanghai Integrated Circuit Research&Development Center Shanghai 201210China Institute of Microelectronics Chinese Academy of SciencesBeijing 100029China

A physical model for simulating overlay metrology employing diffraction based overlay(DBO)principles is *** can help to optimize the metrology wavelength selection in *** result of DBO metrology with a model based on the finite-difference time-domain(FDTD)method is presented.A common case(bottom mark asymmetry)in which error signals are always induced in DBO measurement due to the process imperfection were *** overlay sensitivity of the DBO measurement across the visible illumination spectrum has been performed and *** adjusting the model parameters compatible with the actual measurement conditions,the metrology wavelengths which provide the accuracy and robustness of DBO measurement can be optimized.

关键词： diffraction based overlay scatterometry photolithography simulation metrology wavelength finite difference time domain

A Novel High Volume Manufacturing Method for Defect-free and High-yield SiN Micro-sieve Membranes

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Journal of Microelectronic Manufacturing 2018年第1期1卷 11-20页

作者： Yansong Liu Chao Zhao lisong dong Rui Chen Yayi Wei Key Laboratory of Microelectronic Devices&Integrated Technology Institute of Microelectronics of Chinese Academy of SciencesBeijing 100029China University of Chinese Academy of Sciences Beijing 100049China

Micro-sieves have been widely used in medical treatment,quarantine,environment,agriculture,pharmacy and food ***,the manufacturing and yield improvement have been difficult due to multiple challenges,such as the sieve unit release defect,cracking,and KOH *** this paper,we report process details and discuss technical difficulties which are usually the root-causes for process failures,and demonstrate a reliable and high yield production of SiNx micro-sieves processed with our novel method,which is also compatible with high volume manufacturing.

关键词： micro-sieves high volume manufacturing defect free high yield

光学系统像差对极紫外光刻成像特征尺寸的影响

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光学学报 2019年第12期39卷 273-279页

作者：明瑞锋韦亚一董立松中国科学院大学微电子学院北京100049 中国科学院微电子研究所北京100029

13.5 nm波长极紫外(EUV)光刻机的分辨率虽然很高,但因波长的减小使其对像差的容忍度降低,有必要研究像差对EUV光刻成像的影响。针对四类典型像差的波前特征,选取对像差最敏感的四种测试图形,研究像差对光刻成像特征尺寸和最佳聚焦点偏... 详细信息

13.5 nm波长极紫外(EUV)光刻机的分辨率虽然很高,但因波长的减小使其对像差的容忍度降低,有必要研究像差对EUV光刻成像的影响。针对四类典型像差的波前特征,选取对像差最敏感的四种测试图形,研究像差对光刻成像特征尺寸和最佳聚焦点偏差量的影响。在满足焦深要求的条件下,给出各单类像差的最大允许范围,最后将四类像差总值控制在0.04λ内,从仿真分析的角度研究了实际工艺生产对像差的要求,即总像差需控制在0.025λ以内,约0.34 nm。

关键词：光学设计极紫外光刻像差特征尺寸偏差工艺需求

INVESTIGATION OF PP-EPR DIBLOCK COPOLYMER AS COMPATIBILIZER FOR PP/EPT BLEND

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Chinese Journal of Polymer Science 1985年第3期3卷 216-225页

作者：冯之榴董丽松张伯兰方正杨永宽 E.T.L Voong and Voong Tse Lieu Changchun Institute of Applied Chemistry Academia Sinica Changchun

Blending isotactic polypropylene (PP) with ethylene-propylene terpolymer (EPT) is one of thesimplest and most effective ways for toughening PP. In order to further improve the toughness ofPP/EPT blend and to enhance the stability of the dispersed rubber phase, a diblock copolymer com-posed of PP and ethylene-propylene rubber blocks (PP-EPR) was added into the blend, as it is con-sidered that 'forced compatibility' of the two components will be effected through the two chemi-cally bonded blocks, while two-phase structure still remains. Experimental results indicate that PP-EPR is an effective compatibilizer for PP/EPT blend. Itnot only increases the toughness of the blend, but also decreases the loss of tensile strengths usuallyaccompanying the toughening of plastics with an elastomer, which is very well explained by the mor-phological structure changes when an appropriate amount of PP-EPR was added into the blend.

关键词： EPT INVESTIGATION OF PP-EPR DIBLOCK COPOLYMER AS COMPATIBILIZER FOR PP/EPT BLEND PP EPR AS

INVESTIGATION OF THE TRANSITIONS OF OLIGO-POLYSULFONES BY DSC

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Chinese Journal of Polymer Science 1987年第3期5卷 228-233页

作者：董丽松郑国栋冯之榴 Changchun Institute of Applied Chemistry Academia Sinica Changchun Changchun Formerly E. T. L. Voong and Voong Tse-Lieu

The transitions of bisphenol A and phenolphthalein o|igopolysulfones were investigated by DSC. It is found that both the oligomers have three transitions within the temperature range （230-550K） studied. Considering the strong dependence of the appearance of the two transitions, lower and higher than Tg, on the specimens’ thermal history, i. e., temperature and time of heat-treatment, and their particular molecular strueture, it is proposed that these two transitions are morphological in origin arid are due to the disordering of relatively short range order of very small regions, and to the disordering of relatively well-ordered intraor/and intermoleeular segments, respectively. Equations for linear relationship between Tg and 1/n for both the oligomers are given in the paper.

关键词： Oligo-polysulfone DSC transitions morphology