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CrN films deposited by ion source-assisted magnetron sputtering

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Nuclear Science and Techniques 2010年第5期21卷 289-293页

作者： LIU Chuansheng tian canxin LI Ming HE Jun YANG HuiJuan YANG Bing WANG Hong Jun FU Dejun Key Laboratory of Artificial micro- and nano-Materials of Ministry of Education and School of Physics and Technology Wuhan University 430072 Wuhan China School of Power and Mechanical Engineering Wuhan University 430072 Wuhan China

CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron *** and composition of the coatings were characterized by X-ray diffraction,atomic force microscopy,scanning electron microscopy and transmission electron *** and tribological properties were assessed by microhardness and pin-on-disc *** ion source-assisted system has a deposition rate of 3.88 μm/h,against 2.2 μm/h without ion-source *** CrN coatings prepared with ion source assistance exhibited an increase in microhardness(up to 16.3 GPa) and decrease in friction coefficient(down to 0.48) at the optimized cathode source-to-substrate *** optimized conditions,CrN coatings were deposited on piston rings,with a thickness of 25 μm and hardness of 17.85 GPa.

关键词：溅射离子源磁控溅射氮化铬铬薄膜 Si(100) 透射电子显微镜扫描电子显微镜原子力显微镜

Copper ion beam emission in solid electrolyte Rb_(4)Cu_(16)I_(6.5)Cl_(13.5)

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Chinese Physics B 2022年第4期31卷 239-243页

作者： Tushagu Abudouwufu Xiangyu Zhang Wenbin Zuo Jinbao Luo Yueqiang Lan canxin tian Changwei Zou Alexander Tolstoguzov Dejun Fu Key Laboratory of Artificial Micro and Nanostructures of Ministry of Education and Hubei Key Laboratory of Nuclear Solid Physics School of Physics and TechnologyWuhan UniversityWuhan 430072China Shenzhen Institute of Wuhan University Shenzhen 518057China Zhuhai Tsinghua University Research Institute Innovation Center Zhuhai 519000China School of Physics and Technology Lingnan Normal UniversityZhanjiang 524048China Utkin Ryazan State Radio Engineering University Ryazan 390005Russian Federation

Copper ion conducting solid electrolyte Rb_(4)Cu_(16)I_(6.5)Cl_(13.5)was prepared by means of mechano-chemical *** structure and morphology of the powder was investigated by x-ray diffraction and scanning electron *** grain size was estimated to be 0.2-0.9μm and the ionic conductivity at room temperature was approximately 0.206 S/*** solid electrolyte Rb_(4)Cu_(16)I_(6.5)Cl_(13.5)was exploited for copper ion beam *** copper ion emission current of several nA was successfully obtained at acceleration voltages of 15 kV and temperature of 197℃in vacuum of 2.1×10^(-4)Pa.A good linear correlation between the logarithmic ion current(logI)and the square root of the acceleration voltage(U_(acc))at high voltage range was obtained,suggesting the Schottky emission mechanism in the process of copper ion beam generation.

关键词： solid electrolyte mechano-chemical synthesis ion emission ion-beam source

Influence of Target-Substrate Distance and Sputtering Power on Chromium Oxide Films Prepared by Medium-Frequency Magnetron Sputtering

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Wuhan University Journal of Natural Sciences 2010年第5期15卷 440-443页

作者： YANG Huijuan,HE Jun,tian canxin,LIU Chuansheng,FU Dejun School of Physics and Technology,Wuhan University,Wuhan 430072,Hubei,China School of Physics and Technology Wuhan University Wuhan Hubei China

Chromium oxide films were deposited on Si（100） substrates by medium-frequency（MF） unbalanced magnetron sputtering at different target-substrate distances DTS（60,100,120 mm） and sputtering power（2.8,5.6,11.2 kW）,*** structure,surface morphologies,and microhardness of the chromium oxide films were examined by X-ray diffraction（XRD）,atomic force microscopy（AFM）,and microhardness *** results indicate that elevated MF sputtering power can improve the crystallization of the films;The DTS value affects the structure of the films by changing the preferential orientation from CrO3（221） to Cr2O3（116）;The microhardness of the chromium oxide films is found to increase with the sputtering *** preparing the Cr2O3-dominated films with comparatively high-performance,the optimized condition is the target-substrate distance of 100 mm and MF sputtering power of 11.2 kW.

关键词： chromium oxide magnetron sputtering microstruc-ture hardness

Enhancing NO2 gas sensing performances at room temperature based on TiO2 nanotube arrays/reduced graphene oxide nanocomposites

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Enhancing NO2 gas sensing performances at room temperature b...

工作气压对TiBN/TiAlSiN纳米多层涂层的结构和性能影响

第七届粤港澳真空科技创新发展论坛暨2023年广东省真空学会学术年会

作者： Shimin Chen Xiaoshan Tang canxin tian Changwei Zou Key laboratory of advanced coating and surface engineering Lingnan Normal University

TiO nanotube arrays/reduced graphene oxide nanocomposites（TiO NTs/rGO） with different rGO contents were prepared through a facile two-step *** results of FESEM and TEM showed that the surface of TiO nanotubes is closely bonded with the rGO *** gas sensitivity test results indicated that the optimal TiO NTs/rGO nanocomposites exhibited a response of 19.1 to 1 ppm of NO at room temperature,which was 5.26 times higher than that of undoped TiO *** response/recovery time of TiO nanotube arrays doped with rGO was greatly *** values are as follows:TiO nanotube is 24 s/42 s,while TiO NTs/rGO with 1 wt.% of rGO is 18 s/33 *** the same time,further tests indicated that the sensor based on TiO NTs/rGO nanocomposites showed fast response,excellent selectivity,long-term stability and extremely low detection limit toward NO at room *** significantly enhanced sensing properties to NO could be attributed to larger specific surface area,more chemisorbed oxygen species and the generation of p-n heterojunction between TiO and rGO in the *** work could pave the way for the future design of TiO/Graphene-based gas sensors for oxidizing gases detection at room temperature.

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中国表面工程 2020年第6期33卷 77-85页

作者：王泽松韩滨项燕雄田灿鑫邹长伟付德君岭南师范学院物理科学与技术学院湛江524048 郑州大学第一附属医院放射治疗部郑州450052 武汉大学物理科学与技术学院武汉430072

为应对高速干式切削、工磨具行业对新型防护涂层的需求,制造高硬度、耐摩擦磨损的纳米复合涂层具有巨大的市场前景。采用阴极多弧离子镀技术,在不同的工作气压下用TiB2和TiAlSi合金靶作为阴极蒸发靶材,在硬质合金衬底上分别沉积了TiBN,T... 详细信息

为应对高速干式切削、工磨具行业对新型防护涂层的需求,制造高硬度、耐摩擦磨损的纳米复合涂层具有巨大的市场前景。采用阴极多弧离子镀技术,在不同的工作气压下用TiB2和TiAlSi合金靶作为阴极蒸发靶材,在硬质合金衬底上分别沉积了TiBN,TiAlSiN涂层和TiBN/TiAlSiN多层涂层。借助于XRD、XPS、SEM、AFM和HRTEM对涂层的成分、形貌及微观结构进行表征分析。并用纳米压痕硬度计和球盘式摩擦测试仪分别研究了涂层的硬度和摩擦磨损性能。研究结果表明:TiBN/TiAlSiN涂层呈现一种非晶相包裹纳米多晶相的微观结构形态,工作气压越高,涂层表面越趋于光滑;涂层在1.0 Pa工作气压下涂层显微硬度值达到38 GPa;在2.0 Pa的工作气压下,涂层显微硬度值约34 GPa,摩擦因数低于0.29。与TiBN和TiAlSiN涂层相比,TiBN/TiAlSiN纳米多层涂层的机械、摩擦学性能更加优越,这为应用在干式切削、磨削工具领域的硬质润滑多层涂层的制备与研究指明了一条方向。

关键词： TiBN/TiAlSiN 多弧离子镀工作气压纳米多层涂层微观结构

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一种兆伏级低能加速器端电压的校准方法

核技术 2018年第10期41卷 14-19页

作者：王泽松张瑞田灿鑫王振国付德君岭南师范学院物理科学与技术学院湛江524048 太原科技大学应用科学学院太原030024 武汉大学物理科学与技术学院武汉430072

受设备使用年限、工作环境和零部件更换等因素影响,兆伏(MV)级低能加速器端电压需要通过较准保证经端电压加速决定的出射离子的能量。本方案以2×1.7 MV串列加速器为例,利用12C(p, p)12C材料非卢瑟福背散射谱在1 750 keV能量点附近出现... 详细信息

受设备使用年限、工作环境和零部件更换等因素影响,兆伏(MV)级低能加速器端电压需要通过较准保证经端电压加速决定的出射离子的能量。本方案以2×1.7 MV串列加速器为例,利用12C(p, p)12C材料非卢瑟福背散射谱在1 750 keV能量点附近出现一个孤立的质子共振散射单峰的特点,采用质子(proton, p)束流垂直入射到高纯石墨靶获得12C(p,p)12C的非卢瑟福背散射谱,结合多道分析器(MultichannelAnalyzer,MCA)和SIMNRA6.05拟合程序,定量测量到入射质子束在石墨靶表面发生共振散射的能量阈值为(1 744±2) keV,从而外推出此时加速器端电压的实际值,并对校准结果进行了误差分析。这为MV级低能静电型范德格拉夫加速器(Van der Graff accelerator)或串列加速器在低能区提供了一种有效的端电压较准方法。

关键词：加速器端电压非卢瑟福背散射能量校准

电弧离子镀制备TiN/TiSiN多层涂层及其性能研究

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润滑与密封 2022年第6期47卷 116-122页

作者：刘怡飞宋启萌李助军田灿鑫广州铁路职业技术学院机电工程学院广东广州510430 岭南师范学院物理科学与技术学院广东湛江524048

为提高单一TiN涂层的性能,采用AS600DMTXBE型阳极层离子源辅助电弧离子镀系统制备TiN层和TiSiN层厚度比分别为1∶2、2∶2、3∶1的TiN/TiSiN多层涂层。研究不同厚度比的TiN/TiSiN多层涂层的形貌、结构以及性能,并与TiN涂层性能进行比较... 详细信息

为提高单一TiN涂层的性能,采用AS600DMTXBE型阳极层离子源辅助电弧离子镀系统制备TiN层和TiSiN层厚度比分别为1∶2、2∶2、3∶1的TiN/TiSiN多层涂层。研究不同厚度比的TiN/TiSiN多层涂层的形貌、结构以及性能,并与TiN涂层性能进行比较。结果表明:TiN/TiSiN多层涂层为TiN面心立方结构,其中厚度比为2∶2的TiN/TiSiN多层涂层的TiN(111)衍射峰较强;厚度比为1∶2的TiN/TiSiN多层涂层摩擦因数最低,表明掺入Si的含量越大,涂层减摩性能越好;TiN/TiSiN多层涂层的减摩作用、硬度和结合强度都优于TiN涂层,且厚度比为2∶2的TiN/TiSiN多层涂层的硬度和结合强度均最大;厚度比为2∶2的TiN/TiSiN多层涂层的耐腐蚀性最高,表明Si元素的掺入能够提升涂层的耐腐蚀性能。

关键词：电弧离子镀 TiN/TiSiN多层涂层 TiN涂层硬度摩擦学性能

离子源辅助电弧离子镀制备MoSx自润滑涂层

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粉末冶金材料科学与工程 2018年第2期23卷 186-191页

作者：李助军刘怡飞田灿鑫杨兵付德君苏峰华广州铁路职业技术学院机械与电子学院广州510430 武汉大学加速器实验室武汉430072 华南理工大学机械与汽车工程学院广州510641

以Ar为输送气体,H_2S为S源,纯金属Mo为Mo源,采用中空阴极弧光离子源结合电弧离子镀系统,在单晶Si(100)和硬质合金衬底上制备MoSx自润滑涂层,系统研究H_2S流量对MoSx自润滑涂层结构及性能的影响,为电弧离子镀技术制备MoSx自润滑涂层积累... 详细信息

以Ar为输送气体,H_2S为S源,纯金属Mo为Mo源,采用中空阴极弧光离子源结合电弧离子镀系统,在单晶Si(100)和硬质合金衬底上制备MoSx自润滑涂层,系统研究H_2S流量对MoSx自润滑涂层结构及性能的影响,为电弧离子镀技术制备MoSx自润滑涂层积累实验数据。结果表明,H_2S流量对MoSx自润滑涂层的晶体结构、硬度及摩擦因数具有明显影响。随H_2S流量升高,MoSx自润滑涂层中Mo晶粒尺寸逐渐减小,没有明显的硫化物结晶相,MoSx涂层硬度逐渐减小,摩擦因数也逐渐减小,且均小于0.35(对磨材料硬质合金)。H_2S可以作为S源通过中空阴极离子源离化作用为MoSx自润滑涂层的制备提供S元素;电弧离子镀制备出的MoSx自润滑涂层为金属Mo纳米晶粒与非晶MoS、MoS_2组成的纳米复合结构。

关键词：自润滑涂层中空阴极弧光离子源电弧离子镀 MoSx涂层力学性能

N_(2)气压对CrWN涂层结构及性能影响

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粉末冶金材料科学与工程 2021年第3期26卷 235-242页

作者：何世斌陆惠宏田灿鑫刘怡飞李助军岭南师范学院物理科学与技术学院湛江524048 广州铁路职业技术学院机械与电子学院广州510430

采用电弧离子镀技术制备CrWN涂层,研究沉积N_(2)气压对CrWN涂层的微观结构、形貌、沉积速率、硬度及摩擦学性能的影响。利用SEM,XRD和XPS检测/表征CrWN涂层的晶体结构、形貌及成分;利用硬度计、磨损仪和轮廓仪分别测试CrWN涂层的硬度、... 详细信息

采用电弧离子镀技术制备CrWN涂层,研究沉积N_(2)气压对CrWN涂层的微观结构、形貌、沉积速率、硬度及摩擦学性能的影响。利用SEM,XRD和XPS检测/表征CrWN涂层的晶体结构、形貌及成分;利用硬度计、磨损仪和轮廓仪分别测试CrWN涂层的硬度、摩擦因数及磨损率。结果表明,CrWN涂层为面心立方结构,随着沉积N_(2)气压的升高,CrWN涂层的(111)和(200)衍射峰强度明显增强,涂层表面大颗粒数量和尺寸逐渐减小,沉积速率最高1.13mm/h;当N_(2)气压由0.5 Pa升高到1.0 Pa时,CrWN涂层的显微硬度(HV)由1900增大到2010,随着N_(2)气压进一步升高,CrWN涂层硬度有所降低;CrWN涂层平均摩擦因数稳定在0.5左右,在N_(2)气压2.0 Pa时磨损率达到最大值5.4×10^(-7) mm^(3)/(N·m),明显低于CrN涂层的摩擦因数0.7和磨损率6.7×10^(-7) mm^(3)/(N·m)。

关键词：电弧离子镀 CrWN涂层 N_(2)气压硬度摩擦学特性