CrN films deposited by ion source-assisted magnetron sputtering

作     者：LIU Chuansheng TIAN Canxin LI Ming HE Jun YANG HuiJuan YANG Bing WANG Hong Jun FU Dejun 

作者机构：Key Laboratory of Artificial micro- and nano-Materials of Ministry of Education and School of Physics and Technology Wuhan University 430072 Wuhan China School of Power and Mechanical Engineering Wuhan University 430072 Wuhan China 

出 版 物：《Nuclear Science and Techniques》 (核技术（英文）)

年 卷 期：2010年第21卷第5期

页      面：289-293页

核心收录：

学科分类：08[工学] 082701[工学-核能科学与工程] 0827[工学-核科学与技术] 0803[工学-光学工程] 

基　　金：Supported by the Ministry of Industry and Information Technology (No. 2009ZX04012-032) 

主　　题：溅射离子源 磁控溅射 氮化铬 铬薄膜 Si(100) 透射电子显微镜 扫描电子显微镜 原子力显微镜 

摘      要：CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron *** and composition of the coatings were characterized by X-ray diffraction,atomic force microscopy,scanning electron microscopy and transmission electron *** and tribological properties were assessed by microhardness and pin-on-disc *** ion source-assisted system has a deposition rate of 3.88 μm/h,against 2.2 μm/h without ion-source *** CrN coatings prepared with ion source assistance exhibited an increase in microhardness(up to 16.3 GPa) and decrease in friction coefficient(down to 0.48) at the optimized cathode source-to-substrate *** optimized conditions,CrN coatings were deposited on piston rings,with a thickness of 25 μm and hardness of 17.85 GPa.