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Sharpening emitter localization in front of a tuned mirror

Light(Science & Applications) 2018年第1期7卷 71-78页

作者： Hannah S.Heil benjamin schreiber Ralph Götz Monika Emmerling Marie-Christine Dabauvalle Georg Krohne Sven Höfling Martin Kamp Markus Sauer Katrin G.Heinze Rudolf Virchow Center Research Center for Experimental BiomedicineUniversity of WürzburgJosef-Schneider-Str.297080 WürzburgGermany Department of Biotechnology and Biophysics BiozentrumUniversity of WürzburgAm Hubland97074 WürzburgGermany Technische Physik Physikalisches Institut and Wilhelm Conrad Röntgen-Center for Complex Material SystemsUniversity of WürzburgAm Hubland97074 WürzburgGermany Division of Electron Microscopy BiozentrumUniversity of WürzburgAm Hubland97074 WürzburgGermany SUPA School of Physics and AstronomyUniversity of St AndrewsSt Andrews KY169SSUK

Single-molecule localization microscopy(SMLM)aims for maximized precision and a high signal-to-noise *** features can be provided by placing the emitter in front of a metal-dielectric nanocoating that acts as a tuned mirror2–***,we demonstrate that a higher photon yield at a lower background on biocompatible metal-dielectric nanocoatings substantially improves SMLM performance and increases the localization precision by up to a factor of *** resolution improvement relies solely on easy-to-fabricate nanocoatings on standard glass coverslips and is spectrally and spatially tunable by the layer design and wavelength,as experimentally demonstrated for dual-color SMLM in cells.

关键词： emitter mirror tunable

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Ultra-dense planar metallic nanowire arrays with extremely large anisotropic optical and magnetic properties

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Nano Research 2018年第7期11卷 3519-3528页

作者： Qi Jia Xin Ou Manuel Langer benjamin schreiber Jorg Grenzer Pablo F. Siles Raul D. Rodriguez Kai Huang Ye Yuan Alireza Heidarian Rene Hubner Tiangui You Wenjie Yu Kilian Lenz Jurgen Lindner Xi Wang Stefan Facsko Helmholtz-Zentrum Dresden-Rossendorf Institute of Ion Beam Physics and Materials Research Bautzner Landstr. 400 01328 Dresden Germany State Key Laboratory of Functional Material for Informatics Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China Technische Universitat Chemnitz ReichenhainerstraBe 70 09107 Chemnitz Germany University of Chinese Academy of Sciences Beijing 100049 China Tomsk Polytechnic University 30 Lenin Ave. 634050 Tomsk Russia

A nanofabrication method for the production of ultra-dense planar metallic nanowire arrays scalable to wafer-size is presented. The method is based on an efficient template deposition process to grow diverse metallic nanowire arrays with extreme regularity in only two steps. First, Ⅲ-Ⅴ semiconductor substrates are irradiated by a low-energy ion beam at an elevated temperature, forming a highly ordered nanogroove pattern by a ＂reverse epitaxy＂ process due to self-assembly of surface vacancies. Second, diverse metallic nanowire arrays （Au, Fe, Ni, Co, FeAl alloy） are fabricated on these Ⅲ-Ⅴ templates by deposition at a glancing incidence angle. This method allows for the fabrication of metallic nanowire arrays with periodicities down to 45 nm scaled up to wafer-size fabrication. As typical noble and magnetic metals, the Au and Fe nanowire arrays produced here exhibited large anisotropic optical and magnetic properties, respectively. The excitation of localized surface plasmon resonances （LSPRs） of the Au nanowire arrays resulted in a high electric field enhancement, which was used to detect phthalocyanine （CoPc） in surface-enhanced Raman scattering （SERS）. Furthermore, the Fe nanowire arrays showed a very high in-plane magnetic anisotropy of approximately 412 mT, which may be the largest in-plane magnetic anisotropy field yet reported that is solely induced via shape anisotropy within the plane of a thin film.

关键词： self-assembly metallic nanowire array reverse epitaxy magnetic anisotropy anisotropic dieledric function

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