Fabrication of CoFe Nanostructures by Holographic Lithography

作     者：Zijun Zhang a,Xudi Wang b,Ying Liu a,Yuxian Guo a,Yilin Hong a,Xiangdong Xua,Shaojun Fu a,Pengshou Xu a,Jie Wang a,Jianwang Cai c a National Synchrotron Radiation Laboratory,University of Science and Technology of China/P.O.Box 6022,Hefei,Anhui 230029,China b Academic of Precision Machinery and Precision Instrumentation,USTC,Hefei 230026,China c State Key Laboratory of Magnetism,Institute of Physics and Center of Condensed Matter Physics,Chinese Academy of Sciences,Beijing 100080,China 

会议名称：《2007亚洲光电子会议纳米光子学/纳米结构/纳米计量学分会场》

会议日期：2007年

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

关 键 词：holographic lithography,patterned media,oxygen descumming,hysteresis loops 

摘      要：A novel process that combines interference lithography and ion beam etching is presented for fabrication of magnetic submicron structures and nanostructures in this *** of an antireflective coating,vertical standing wave patterns were removed using oxygen descumming process.A series of magnetic submicronmeter structures were fabricated on Co0.9Fe0.1 films by this *** of magnetic nanostructures was performed by using a high exposure dose and modifications in optimized development conditions.A thin Au film was deposited on the sidewall of the magnetic nanostructures to avoid the oxidation of Co and *** effect of this method was confirmed by X-ray photoelectron spectroscopy(XPS).Hysteresis loops measured by a highly sensitive superconducting quantum interference device(SQUID)technique show the different magnetic properties of the magnetic patterns with different critical dimensions.