State Control of Passivating Films in Electrolytic in-process Dressing (ELID) Precision Grinding for Silicon Nitride

作     者：Ren Chengzu, Che Jianming, Wang Taiyong, Jin Weidong The State Education Ministry Key Laboratory of Advanced Ceramics and Machining Technique, Tianjin University, Tianjin 300072, P.R. China 

会议名称：《亚洲精密工程、微纳技术国际会议》

会议日期：2005年

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

关 键 词：Electrolytic in process dressing, Precision grinding, State control of passivating film 

摘      要：In this paper the authors analyzed the functions of the passivating film, the factors influencing the thickness and compactness of the film and the control strategies of the film state in ELID grinding. The loop current which can characterize the film state was monitored, and the experiments of the ELID grinding were conducted in the active controlling of the film state with the control strategy of discontinuous in-process electrolyzing.