The 2-axis stress component decoupling of {100} c-Si by using oblique backscattering micro-Raman spectroscopy
The 2-axis stress component decoupling of {100} c-Si by using oblique backscattering micro-Raman spectroscopy作者机构:Tianjin Key Laboratory of Modern Engineering MechanicsDepartment of MechanicsTianjin UniversityTianjin 300350China Department of Mechanical EngineeringLamar UniversityBeaumont TX 77710USA Department of Electrical and Computer EngineeringUniversity of DelawareNewark DE 19711USA
出 版 物:《Science China(Physics,Mechanics & Astronomy)》 (中国科学:物理学、力学、天文学(英文版))
年 卷 期:2020年第63卷第9期
页 面:51-57页
核心收录:
学科分类:080903[工学-微电子学与固体电子学] 081704[工学-应用化学] 07[理学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 0817[工学-化学工程与技术] 070302[理学-分析化学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学] 0703[理学-化学] 0704[理学-天文学]
基 金:the National Key Research and Development Program of China(Grant No.2018YFB0703500) the National Natural Science Foundation of China(Grant Nos.11827802,11772223,11772227,11890680,and 61727810)
主 题:{100}c-Si stress component decoupling oblique backscattering micro-Raman spectroscopy
摘 要:With the application of strain engineering in microelectronics,complex stress states are introduced into advanced semiconductor ***,there is still a lack of effective metrology for the decoupling analysis of the complex stress states in semiconductor *** paper presents an investigation on the 2-axis stress component decoupling of{100}monocrystalline silicon(c-Si)by using oblique backscattering micro-Raman spectroscopy.A spectral-mechanical model was established,and two practicable methods for actual stress decoupling analyses were *** verification experiments demonstrated the correctness and applicability of the methods proposed in this paper.