Influence of vacuum annealing and irradiation on magnetic properties of Fe-3% Y_2O_3 films

作     者：LI Zhengcao YU Xiaoyi MIAO Wei ZHANG Zhengjun 

作者机构：State Key Laboratory of New Ceramic and Fine Processing Department of Materials Science and Engineering Tsinghua University Beijing 100084 China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2011年第30卷第5期

页      面：453-457页

核心收录：

学科分类：080503[工学-材料加工工程] 0809[工学-电子科学与技术（可授工学、理学学位）] 07[理学] 070205[理学-凝聚态物理] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0802[工学-机械工程] 080201[工学-机械制造及其自动化] 0702[理学-物理学] 

基　　金：support by the National Natural Science Foundation of China (No. 61076003) the National Basic Research and Development Program of China (Nos. 2010CB731600 and 2010CB832900) 

主　　题：magnetic films yttria magnetron sputtering annealing irradiation magnetic properties 

摘      要：Yttria （Y） dispersed ferrum （Fe） films were prepared by a double-target magnetron co-sputtering method. Vacuum annealing and xenon ion irradiation were conducted to investigate the influence on the magnetic and mechanical properties of the films. The crystal grain growth mechanism and second phase precipitation mechanism were conducted simultaneously in the vacuum annealing process. These two effects led to an opposite variation of nano-hardness and coercivity in the films. Xenon ion irradiation played a role in rapid annealing, which also affected the magnetic performance of the yttria dispersed ferrum films.