Catalyst Enhanced Chemical Vapor Depositionof Nickel on Polymer Surface

作     者：俞亚冕 LIU Yiqin WANG Jun 卿山 俞开潮 

作者机构：Faculty of Metallurgical and Energy Kunming University of Science and Technology School of Energy and Power Engineering Huazhong University of Science and Technology School of Chemistry and Chemical Engineering Key Laboratory of Material Chemistry for Energy Conversion and Storage (Ministry of Education) Huazhong University of Science and Technology 

出 版 物：《Journal of Wuhan University of Technology(Materials Science)》 (武汉理工大学学报（材料科学英文版）)

年 卷 期：2019年第34卷第2期

页      面：293-298页

核心收录：

学科分类：081705[工学-工业催化] 08[工学] 0817[工学-化学工程与技术] 080502[工学-材料学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：Funded by the National Natural Science Foundation of China(51566005) 

主　　题：catalyst enhanced chemical vapor deposition teflon polyimide(PI) polysulfone(PS) nickel film palladium complex catalyst 

摘      要：Catalyst enhanced chemical vapor deposition of nickel film on high Tg polymers such as teflon(PTFE), polyimide(PI), and polysulfone(PS) was investigated by hot wall and cold wall CVD, in which Ni(dmg)_2, Ni(acac)_2, Ni(hfac)_2, Ni(TMHD)_2, and Ni(cp)_2 are used as precursors, and palladium complexes are used as catalysts. The films obtained were shiny with silvery color. The Ni was metallic and the purity of Ni was about 92%-95% from XPS analysis. SEM micrographs show that the film had good morphology. The conductivity of the film was about 0.5-4 W·cm^(-1). Ni films had good adhesion with polyimide and polysulfone.