Emission spectra of microwave plasma and MPCVD transparent diamond film

作     者：周健 何伟 袁润章 姜德生 汪建华 

作者机构：Wuhan Univ Technol State Key Lab Adv Technol Mat Synth & Proc Wuhan 430070 Peoples R China Wuhan Univ Technol Fiber Opt Sensing Technol Res Ctr Wuhan 430070 Peoples R China 

出 版 物：《中国有色金属学会会刊：英文版》 (Transactions of Nonferrous Metals Society of China)

年 卷 期：2000年第10卷第4期

页      面：502-504页

核心收录：

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：Project ( 99J0 70 )supportedbytheNaturalScienceFoundationofHubeiProvince 

主　　题：emission spectra H γ C 2 MPCVD tansparent diamond film 

摘      要：The emission spectra of microwave plasma was in line measured in visible light wave band using a self made optical fiber spectrometer, the change rule of the atomic hydrogen ( H ) and double carbon radical( C 2) was given under different CH 4/H 2 ratios of volume flow. The effect of atomic hydrogen ( H ) on CVD diamond, deposited high quality and transparent diamond film by microwave plasma CVD (MPCVD) was analyzed according to the measured results by scanning electron microscopy(SEM), laser Raman spectrometry(Raman), and Fourier transform infrared spectrometry(FTIR). The results showed that the diamond film consisted of (220) orientation and it was homogeneous, compact, low defective, high quality film, its infrared transmissibility was about 70%, approached theoretical transmissibility of diamond. It was key conditions that a large number of atomic hydrogen ( H γ ) and double carbon radical( C 2) exist in the course of high quality diamond film growth. The research provided a rapid method for technology exploration of microwawe plasma CVD, and a reliable basis for research on growth mechanism of diamond film.