Synthesis of ZnO films with a special texture and enhanced field emission properties

作     者：王小平 王子 王丽军 梅翠玉 

作者机构：College of Science University of Shanghai for Science and Technology School of Transportation Engineering Tongji University 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2011年第20卷第10期

页      面：325-328页

核心收录：

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0704[理学-天文学] 

基　　金：supported by the Science Foundation of Shanghai Human Resources and Social Security Bureau  China (Grant No. 2009023) 

主　　题：nano-ZnO thin films hydrogen plasma treatment field electron emission microwaveplasma chemical vapour deposition 

摘      要：ZnO films with special textures ave fabricated on Mo-coated Al2O3 ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density -0.11 mA/cm2 at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.