Deposition of Titanium Layer on Steel Substrate Using PECVD Method: A Parametric Study

作     者：Haman Hedaiatmofidi Alireza Sabour Rouh Aghdam Shahrokh Ahangarani Mansour Bozorg Mahboube Azadi Maryam Valiei 

作者机构：Advanced Materials & Renewable Energies Department Iranian Research Organization for Science and Technology Tehran Iran Material Science and Technology Azad University Tehran Iran Surface Engineering Laboratory Materials Engineering Department Faculty of Engineering Tarbiat Modares University Tehran Iran 

出 版 物：《Materials Sciences and Applications》 (材料科学与应用期刊（英文）)

年 卷 期：2014年第5卷第3期

页      面：140-148页

学科分类：07[理学] 0703[理学-化学] 

主　　题：PECVD Titanium Layer Oxygen Content XPS 

摘      要：Metallic titanium film was deposited on H-13 steel substrate at 470°C - 530°C using plasma enhanced chemical vapor deposition (PECVD) method. In this paper, the effects of manufacturing parameters were investigated on deposited titanium coating characteristics. XRD, FESEM, XPS and AFM were used in order to study coating characteristics. Increasing hydrogen flow rate from 200 to 360 sccm, resulted in a 72% decrease in oxygen content and 38% decrease in chlorine content of the film. Applied plasma voltage has a severe effect on nanohardness of coating. Pressure of the deposition chamber has a negative effect on titanium characteristics.