Composition and Morphology of Electrodeposited CuInSe_2 Precursor Films
Composition and Morphology of Electrodeposited CuInSe_2 Precursor Films作者机构:School of Metallurgical Science and Engineering Central South University Changsha 410083 China
出 版 物:《Journal of Materials Science & Technology》 (材料科学技术(英文版))
年 卷 期:2009年第25卷第2期
页 面:242-246页
核心收录:
学科分类:080903[工学-微电子学与固体电子学] 0821[工学-纺织科学与工程] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学] 082103[工学-纺织化学与染整工程]
主 题:CuInSe2 Electradeposition Composition Morphology
摘 要:CulnSe2 (CIS)precursor films have been prepared by electrodeposition in aqueous solution. The electrodeposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS) for structural, morphological and componential properties. The influence of deposition potential and Na-citrate concentration on composition and morphology of electrodeposited films was studied in detail. It is found that the film morphology is strongly influenced by deposition potential and Na-citrate concentration. Films with large and homogenous grain size and ratio of Cu/In approaching 1 were obtained at deposition potentials of -0.7 and -0.75 V vs the saturated calomel electrode (SCE) and Na-citrate concentration of 500 mmol/L. Chalcopyrite phase CulnSe2 is contained in precursor films that have poor crystallinity.