STRUCTURE, MAGNETISM AND MAGNETORESISTANCE OF ANNEALED Co/Cu DISCONTINUOUS MULTILAYERS

作     者：Yan, S.S. Lou, J.X. Zhang, L. Zhang, R.Z. Zhang, Y.M. Liu, Y.H. Mei, L.M. Huang, J. 

作者机构：Shandong Univ Jinan China 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报（英文版）)

年 卷 期：1997年第10卷第6期

页      面：465-473页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0802[工学-机械工程] 080201[工学-机械制造及其自动化] 

主　　题：Copper Magnetic properties Multilayers Sputtering Transport properties 

摘      要：Co/Cu discontinuous multilayers were prepared by rf-sputtering method under high sputtering power and then annealed at various temperatures in a high vacuum. The structural, magnetic and transport properties were strongly influenced by the annealing temperature. The annealed samples obviously became discontinuous multilayers. A maximum magnetoresistance ratio of 5.6% was obtained under a relatively low saturation field of about 400 (10/4π) A/m at the optimum annealing temperature of 450°C. When the annealing temperature was increased, the resistivity decreased, and the coercive force and the saturation field increased. The magnetoresistance ratio also depended on the thickness of Co and Cu layers. The magnetic and transport properties were explained on the basis of the discontinuous multilayered structure.