Effect of Substrate Bias on Microstructure and Properties of Tetrahedral Amorphous Carbon Films

作     者：Jiaqi ZHU Jiecai HAN Songhe MENG Qiang LI Manlin TAN 

作者机构：Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2003年第19卷第Z1期

页      面：109-111页

核心收录：

学科分类：0817[工学-化学工程与技术] 0806[工学-冶金工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0703[理学-化学] 0802[工学-机械工程] 0801[工学-力学（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：National Key Research Plans in 'the tenth Five-year'(41312040401) 

主　　题：Tetrahedral amorphous carbon, Filtered cathodic vacuum arc, Substrate bias 

摘      要：The microstructure and properties of tetrahedral amorphous carbon (ta-C) films deposited by the filtered cathodic vacuum arc technology has been investigated by visible Raman spectroscopy, AFM and Nano-indentor. The Raman spectra have been fitted with a single skewed Lorentzian lineshape described by BWF function defining coupling coefficient, which characterizes the degree of asymmetry and is correlated with the sp3 content. When the substrate bias is -80 V, the sp3 content is the most and simultaneously the coupling coefficient is the least, following with the minimum root mean square surface roughness (Rq=0.23 nm) and the highest hardness (51.49 GPa), Young′s modulus (512.39 GPa), and critical scratching load (11.72 mN). As the substrate bias is increased or decreased, the sp3 content and other properties lower correspondingly.