Analysis of recoverable and permanent components of threshold voltage shift in NBT stressed p-channel power VDMOSFET

作     者：Danijel Dankovi Ninoslav Stojadinovi Zoran Priji Ivica Mani Vojkan Davidovi Aneta Priji Snezana Djoric-Veljkovi Snezana Golubovi 

作者机构：Department of MicroelectronicsFaculty of Electronic EngineeringUniversity of Nis Department of MathematicsPhysics and InformaticsFaculty of Civil Engineering and ArchitectureUniversity of Nis 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2015年第24卷第10期

页      面：386-394页

核心收录：

学科分类：080903[工学-微电子学与固体电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 0704[理学-天文学] 

基　　金：Project supported by the Fund from the Ministry of Education,Science and Technological Development of the Republic of Serbia(Grant Nos.OI-171026 and TR-32026) the Ei PCB Factory,Ni 

主　　题：negative bias temperature instability vertical double-diffused metal-oxide semiconductor recov- erable permanent degradation 

摘      要：In this study we investigate the dynamic recovery effects in IRF9520 commercial p-channel power vertical double diffused metal-oxide semiconductor field-effect transistors（VDMOSFETs） subjected to negative bias temperature（NBT）stressing under the particular pulsed bias. Particular values of the pulsed stress voltage frequency and duty cycle are chosen in order to analyze the recoverable and permanent components of stress-induced threshold voltage shift in detail. The results are discussed in terms of the mechanisms responsible for buildup of oxide charge and interface traps. The partial recovery during the low level of pulsed gate voltage is ascribed to the removal of recoverable component of degradation, i.e., to passivation/neutralization of shallow oxide traps that are not transformed into the deeper traps（permanent component）.Considering the value of characteristic time constant associated with complete removal of the recoverable component of degradation, it is shown that by selecting an appropriate combination of the frequency and duty cycle, the threshold voltage shifts induced under the pulsed negative bias temperature stress conditions can be significantly reduced, which may be utilized for improving the device lifetime in real application circuits.