Preparation of rutile TiO_(2) thin films by laser chemical vapor deposition method

作     者：Dongyun GUO Akihiko ITO Takashi GOTO Rong TU Chuanbin WANG Qiang SHEN Lianmeng ZHANG 

作者机构：State Key Laboratory of Advanced Technology for Materials Synthesis and Processingand School of Materials Science and EngineeringWuhan University of TechnologyWuhan 430070China Institute for Materials ResearchTohoku UniversitySendai 980-8577Japan 

出 版 物：《Journal of Advanced Ceramics》 (先进陶瓷（英文）)

年 卷 期：2013年第2卷第2期

页      面：162-166页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：This work was supported in part by the Global COE Program of the Materials Integration,Tohoku University,and the International Science and Technology Cooperation Program of China(Grant No.2009DFB50470) This work was also supported in part by the International Science and Technology Cooperation Project of Hubei Province(Grant No.2010BFA017)and the 111 Project of China(Grant No.B13035) 

主　　题：rutile TiO_(2)thin film laser chemical vapor deposition(LCVD) laser power total pressure microstructure 

摘      要：TiO_(2) thin films were prepared on Pt/Ti/SiO_(2)/Si substrate by laser chemical vapor deposition(LCVD)*** effects of laser power(P_(L))and total pressure(p_(tot))on the microstructure of TiO_(2) thin films were *** deposition temperature(T_(dep))was mainly affected by P_(L),increasing with P_(L) *** single-phase rutile TiO_(2) thin films with different morphologies were *** morphologies of TiO_(2) thin films were classified into three typical types,including the powdery,Wulff-shaped and granular microstructures.p_(tot) and T_(dep) were the two critical factors that could be effectively used for controlling the morphology of the films.