Compositional dependence of Raman frequencies in Si_xGe_(1-x) alloys
Compositional dependence of Raman frequencies in Si_xGe_(1-x) alloys作者机构:College of Electronic EngineeringGuangxi Normal University Department of PhysicsChengde Teacher's College for Nationalities
出 版 物:《Journal of Semiconductors》 (半导体学报(英文版))
年 卷 期:2012年第33卷第11期
页 面:1-5页
核心收录:
学科分类:080903[工学-微电子学与固体电子学] 0808[工学-电气工程] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 080502[工学-材料学] 0703[理学-化学] 0702[理学-物理学]
基 金:supported by the National Natural Science Foundation of China(Nos.10847004 61264008)
主 题:Raman spectroscopy Si_xGe_(1 x) nanocrystals DFT calculation
摘 要:Increases in Si content and the calculated Raman spectra acquired from the Si_xGe_(1-x) alloys reveal that the frequencies of the Ge-Si and Si-Si modes are up-shifted obviously,meanwhile that of the Ge-Ge optical mode is down-shifted,which is strongly dependent on their microstructural *** linear decrease and increase caused by their force constant(bond lengths and bond angles) changes,which can be used as a fingerprint to identify the average Si *** complex microstructural changes induced by increasing Si content can be clearly displayed by Raman spectra transformation.