Spin-Polarized Electron Injection in Co/Cu/Fe Sandwich Structure

作     者：WANG Shou-guo CHEN Yan-Xue WANG Zhi-he CHEN Qiang CHEN Jmg-Lin SHEN Hong-Lie LIU Yi-Hua XIE Shi-jie MEI Liang-mo 王守国;陈延学;王智河;陈强;陈敬林;沈鸿烈;刘宜华;解士杰;梅良模

作者机构：Department of PhysicsShandong UniversityJi Jnan 250100 Shanghai Metallurgy InstituteChinese Academy of SciencesShanghai 200050 Institute of Plasma PhysicsChinese Academy of SciencesHefei 230031 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：2000年第17卷第8期

页      面：603-605页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：Supported by the National Natural Science Foundation of China under Grant No.59731010 

主　　题：Co/Cu Electron roughness 

摘      要：A material asymmetry Co/Cu/Fe junction structure has been prepared for studying the spin-polarized electron injection at *** sample performance was demonstrated to be analogous to that of a bipolar *** maximal value of the output pulse voltage between Cu and Fe layers could reach the order of severalμV when the bias current between Co and Cu layers was 10μ*** interface roughness,photograph of material,magnetic loop and injection characteristic curves have been *** important points on this topic have been discussed.