Deposition of TiN/TiAlN multilayers by plasma-activated EB-PVD:tailored microstructure by jumping beam technology

作     者：Guo-Yuan Yang Hui Peng Hong-Bo Guo Sheng-Kai Gong 

作者机构：School of Materials Science and EngineeringBeihang UniversityBeijing 100191China Beijing Key Laboratory for Advanced Functional Material and Thin Film TechnologyBeihang UniversityBeijing 100191China Key Laboratory of Aerospace Materials and Performance(Ministry of Education)Beihang UniversityBeijing 100191China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2017年第36卷第8期

页      面：651-658页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 080502[工学-材料学] 

基　　金：financially supported by the National Natural Science Foundations of China(Nos.51201005 and 51231001) 

主　　题：Nano-multilayer coatings Superlattice Plasmaactivation TiN/TiAlN EB-PVD Hardness 

摘      要：Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this *** from the conventional coating methods,the multilayers were obtained by manipulating electron beam（EB）to jump between two different evaporation sources alternately with variable frequencies（jumping beam technology）.The plasma activation was generated by a hollow cathode plasma *** deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods（M1：26.5 nm,M2：80.0 nm,M3：6.0 nm,M4：4.0 nm）.The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer *** columnar structure of the coatings（TiN,TiAlN,M1,M2）is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm（M3,M4）.Simultaneously,superlattice growth *** the decrease of modulation period,both the hardness and the plastic deformation resistance（H^3/E^2,H-hardness and E-elastic modulus）increase.M4coating exhibits the maximum hardness of（49.6±2.7）GPa and the maximum plastic deformation resistance of^0.74 GPa.